Heterojunction battery layered hydrogen passivation method, hydrogen passivation device, battery, battery module and solar power station

A heterojunction battery, hydrogen passivation technology, applied in electrical components, circuits, photovoltaic power generation, etc., can solve the problem of limited passivation and achieve the effect of reducing the surface recombination rate

Inactive Publication Date: 2019-11-15
SUZHOU MAIZHENG TECH CO LTD
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Problems solved by technology

However, for various impurities, crystal defects, or interface state defects on the surface of silicon wafers in conventional crystalline silicon cells, TopCon cells, rear passivation cells, or heterojunction cells, the hydrogen source for passivation is mostly the one that has been plated on the silicon cell. Thin film layers or optional stacks of dielectric materials and semiconductor materials such as hydrogen-containing silicon nitride (SiN x :H), silicon oxynitride (SiO x N y :H), alumina (AlO x :H), silicon oxide (SiO x :H), aluminum oxynitride (AlO x N y :H), amorphous silicon (a-Si:H), nano-silicon (nc-Si:H), microcrystalline silicon (μc-Si:H), polycry

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  • Heterojunction battery layered hydrogen passivation method, hydrogen passivation device, battery, battery module and solar power station

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Embodiment Construction

[0027] The technical solution of the present invention will be further described below in conjunction with the accompanying drawings.

[0028] Heterojunction cell (HIT or HJT) is a heterojunction with intrinsic thin layer, which is a hybrid solar cell made of crystalline silicon substrate and amorphous silicon film. It has low process temperature, high conversion efficiency, high temperature It is a low-cost high-efficiency battery with good characteristics.

[0029] The heterojunction cell structure (HIT or HJT) usually has n-type crystalline silicon c-Si as the intermediate substrate, and intrinsic amorphous silicon with a thickness of 5-10 nm is sequentially deposited on the front side of the cleaned and textured n-type crystalline silicon c-Si Thin film (i-a-Si:H) and n-type amorphous silicon film (n-a-Si:H) form a surface field, and an intrinsic amorphous silicon film (i-a-Si:H) with a thickness of 5-10nm is deposited on the back surface of the silicon wafer in sequence ...

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Abstract

The invention discloses a heterojunction battery layered hydrogen passivation method, a hydrogen passivation device, a battery, a battery module and a solar power station. According to the hydrogen passivation method, at least one time of hydrogen passivation treatment is carried out on the semi-finished product of the heterojunction battery during the heterojunction battery preparation process, and in the case of hydrogen passivation treatment, the semi-finished product of the heterojunction battery is heated and irradiated by a light source. The heterojunction battery layered hydrogen passivation method adopts the hydrogen passivation process during the heterojunction battery preparation process, high-concentration hydrogen atoms can be diffused to the interface of a silicon crystal, a silicon dangling bond on the interface can be better passivated, and the surface recombination rate of the silicon crystal is significantly reduced.

Description

technical field [0001] The invention relates to the technical field of battery sheet manufacturing, in particular to a layered hydrogen passivation method for a heterojunction battery, a hydrogen passivation device, a battery, a battery assembly and a solar power supply station. Background technique [0002] Heterojunction solar cells have attracted the attention of researchers at home and abroad because of their characteristics such as low process temperature, high conversion efficiency, good cell stability and low temperature coefficient. In general, there are a large number of interface state defects on the surface of silicon wafers, which are mainly caused by a large number of dangling bond defects on the surface of silicon wafers, which are effective photogenerated carrier recombination centers. Both experimental and theoretical results show that when the interface state defect density is too large, the open-circuit voltage, fill factor, and conversion efficiency of the...

Claims

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Application Information

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IPC IPC(8): H01L31/20H01L31/0216H01L31/0747
CPCH01L31/02167H01L31/0747H01L31/202H01L31/208Y02E10/50Y02P70/50
Inventor 周剑其他发明人请求不公开姓名
Owner SUZHOU MAIZHENG TECH CO LTD
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