Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method and device for harmless treatment of recycled copper oxychloride

A technology of harmless treatment and copper chloride, applied in the direction of copper chloride, copper halide, etc., to achieve the effect of simple process flow, large processing capacity and maximization of resource utilization

Active Publication Date: 2019-12-13
DAYE NONFERROUS METALS
View PDF12 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is: for the basic copper chloride crude product recovered from waste circuit boards, waste printed circuit boards and printed circuit board etching waste liquid at present, adopt existing pyrometallurgy or hydrometallurgy There are certain problems when further recovering the valuable metals in the method, and a method and device for harmless treatment and recovery of basic copper chloride are provided

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for harmless treatment of recycled copper oxychloride
  • Method and device for harmless treatment of recycled copper oxychloride

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] see figure 1 , a method for harmless treatment and recovery of basic copper chloride, comprising the steps of:

[0054] (1) Add the recovered basic copper chloride into the dissolution kettle 1 with a stirring device, slowly add a sulfuric acid solution with a mass fraction of 40%, stir while adding, until the pH of the feed liquid is stable to 7.5, and detect the copper ions in the feed liquid The content is 42g / L, and the total volume of feed liquid is 35m 3 ;

[0055] (2) Transfer the feed liquid to the primary reactor 2, fill the feed liquid with 3 / 4 volume of the primary reactor, seal the top of the primary reactor, and slowly inject hydrogen sulfide gas into the primary reactor from the bottom of the reactor , control the flow rate of hydrogen sulfide gas to 0.8m 3 / min, the amount of feed is 0.5 times the molar amount of copper ions (253L), after the completion of hydrogen sulfide feed, keep the sealed state for 15 minutes;

[0056] (3) Release the material f...

Embodiment 2

[0060] A method for harmless treatment and recovery of basic copper chloride, comprising the steps of:

[0061] (1) Add the recovered basic copper chloride into a dissolution kettle with a stirring device, slowly add a sulfuric acid solution with a mass fraction of 20%, and stir while adding until the pH of the feed liquid is stable to 7.0, and detect the copper ion content in the feed liquid 30g / L, the total volume of feed liquid is 30m 3 ;

[0062] (2) Transfer the feed liquid to the primary reactor, make the feed liquid fill 2 / 3 of the volume of the primary reactor, seal the top of the primary reactor, and slowly introduce hydrogen sulfide gas from the bottom of the reactor into the primary reactor, Control the flow rate of hydrogen sulfide gas to 0.5m 3 / min, the feed rate is 0.7 times the copper ion content (220L), after the hydrogen sulfide feed is completed, keep the sealed state for 10 min;

[0063] (3) Release the material from the bottom of the primary reactor, pr...

Embodiment 3

[0067] see figure 1 , a method for harmless treatment and recovery of basic copper chloride, comprising the steps of:

[0068] (1) Add the recovered basic copper chloride into a dissolution kettle with a stirring device, slowly add a sulfuric acid solution with a mass fraction of 80%, and stir while adding until the pH of the feed liquid is stable to 8, and detect the copper ion content in the feed liquid is 50g / L, and the total volume of feed liquid is 30m 3 ;

[0069] (2) Transfer the feed liquid to the primary reactor, make the feed liquid fill 3 / 4 of the volume of the primary reactor, seal the top of the primary reactor, and slowly inject hydrogen sulfide gas from the bottom of the reactor into the primary reactor, Control the flow rate of hydrogen sulfide gas to 1m 3 / min, the feeding amount is twice the copper ion content (447L), after the hydrogen sulfide feeding is completed, keep the sealed state for 10 minutes;

[0070](3) Release the material from the bottom of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method and device for harmless treatment of recycled copper oxychloride. The method includes: (1) adding acid into recycled copper oxychloride for dissolution; (2) transferring the feed liquid into a first-stage reaction kettle, and introducing hydrogen sulfide gas for reaction with metal ions in the feed liquid to generate precipitate; (3) discharging the materials fromthe first-stage reaction kettle for filter pressing, treating the filter residue as copper concentrate to recover valuable metal elements therein, putting the filtrate into a second-stage reaction kettle, introducing hot air, and converting fluorine and chlorine elements in the feed liquid into hydrogen fluoride and hydrogen chloride gas; and (4) guiding the hydrogen fluoride and hydrogen chloridegas generated by the second-stage reaction kettle into a first-stage absorption tower, spraying water to absorb hydrogen fluoride and hydrogen chloride gas, guiding unabsorbed tail gas into a second-stage absorption tower, and spraying alkali liquor to absorb tail gas. The method provided by the invention solves the defects of traditional pyrometallurgy and hydrometallurgy treatment of recycled copper oxychloride, puts forward the new process for green and environment-friendly treatment of recycled copper oxychloride, and maximumly recycles valuable metal elements therein.

Description

technical field [0001] The invention relates to the technical field of recycling waste circuit boards, in particular to a method and device for harmless treatment and recycling of basic copper chloride. Background technique [0002] Since the 20th century, with the rapid development of the electronic information industry, the amount of electronic waste generated has been increasing at a rate of 10-15% per year. China is the largest consumer of electronic products. Every year, no less than 7 million tons of electronic products are discarded due to replacement. Among them, waste circuit boards are an important part of electronic waste and the most valuable part of recycling. Waste circuit boards are different from domestic waste, usually containing about 30% of glass fiber reinforced resin, about 30% of inert oxides and about 40% of valuable metals, valuable metals mainly include about 20% of copper, about 8% of Iron, about 2% of nickel, about 4% of tin, about 2% of zinc, etc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01G3/05
CPCC01G3/05Y02P10/20
Inventor 李伟万黎明宁瑞乐安胜刘臻伟任鹏博马登峰
Owner DAYE NONFERROUS METALS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com