A zirconium tantalum boron coating and its preparation method and application
A zirconium tantalum boron and boron coating technology is applied in the field of zirconium tantalum boron coating and its preparation, which can solve the problems affecting the high temperature mechanical properties and oxidation resistance of materials, and achieve the effect of improving application potential, high hardness and toughness
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[0023] The invention provides a method for preparing a zirconium tantalum boron coating, comprising the following steps: using ZrB 4 target and TaB 2 The target is a target material, and the zirconium tantalum boron coating is obtained by sputtering on the surface of the substrate by using a magnetron sputtering method.
[0024] In the present invention, the ZrB 4 The purity of the target is preferably 99 to 99.99%; the ZrB 4 The target is preferably a cylinder with a diameter of preferably 40-80 mm, more preferably 60 mm, and a thickness of 5 mm. In the present invention, the ZrB 4 The target is preferably subjected to pre-sputtering to remove impurities such as oxides on the surface of the target. In the present invention, the pre-sputtering is preferably carried out under an argon atmosphere, and ZrB during the pre-sputtering 4 The power of the target is preferably 100W, and the time is preferably 15-20min. In the present invention, during the pre-sputtering process, ...
Embodiment 1
[0039] Substrate pretreatment: before loading the single crystal sapphire (0001) substrate and polished titanium sheet into the coating chamber, ultrasonic cleaning should be performed on them. Ethanol and deionized water were sonicated for 15 minutes and then taken out, and each step was dried with nitrogen to obtain a substrate with a clean surface;
[0040] Place the target and evacuate the coating chamber: ZrB 4 target and TaB 2 Put the target into the target stage, then put the sapphire substrate and polished titanium sheet into the sample tray, such as Figure 5 As shown, close the coating chamber, close the vent valve, and then use the mechanical pump and the molecular pump to pump the pressure of the coating chamber to 6×10 -4 Pa;
[0041] Pre-sputtering: Before sample preparation, in order to remove impurities such as oxides on the surface of the target, it is necessary to sputter the target in an argon atmosphere for 20 minutes; keep the sample baffle closed durin...
Embodiment 2
[0045] The preparation method is substantially the same as in Example 1, except that TaB 2 The target power was 50W. The atomic content of Zr in the obtained zirconium tantalum boron coating is 19%, the atomic content of Ta is 14.8%, and the atomic content of B is 66.2%. Wear rate 9.2×10 -13 m 3 / Nm.
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