Terahertz metamaterial biosensor and preparation method and detection method thereof
A biosensor and metamaterial technology, which is applied in the analysis of materials, material analysis by optical means, instruments, etc., can solve the problems of complex operation, long time, and inability to meet rapid detection, and achieve high sensitivity and reliability.
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[0084] The metal preparation method is: the bottom metal layer growth method is electroplating or magnetron sputtering, and the surface layer gold growth method is electron beam evaporation.
[0085] In some embodiments of the present invention, the response waveband of the biosensor is in the terahertz range, and the waveband range is 0.5-3 THz.
[0086] In some embodiments of the present invention, the antibodies or probes that recognize different cancer markers modified on the metamaterial are: CEA (carcinoembryonic antigen), CA125 (glycoprotein antigen 125), AFP (alpha-fetoprotein) , CA15-3 (glycoprotein antigen 15-3), GGT-II (glutamyl transpeptidase isoenzyme II), CA19-9 (glycoprotein antigen 19-9), CA42 (glycoprotein antigen 42), microRNA4484 , MicroRNA3646 and other conventional cancer marker antibodies and microRNA probes.
[0087] The detection method of the negative refractive index terahertz metamaterial biosensor used for cancer early warning as described above, the prin...
Embodiment 1
[0133] Prepare the negative refractive index terahertz metamaterial biosensor according to the following steps:
[0134] (1) Substrate preparation: Boil for 8 minutes in acetone solution to remove organic contaminants on the surface of the substrate before the metamaterial processing process, then boil with absolute ethanol solution for 10 minutes to remove acetone, and finally rinse with deionized water. Blow dry with nitrogen.
[0135] (2) Metamaterial structure construction:
[0136] Using micro-nano processing lithography technology to realize the transfer of metamaterial patterns on the substrate. First, the photoresist (AR-N4340) is coated on the previously processed substrate by spin coating. Bake for 15 minutes before 95°C, expose to build those metamaterial structures on the substrate, and bake for 10 minutes after 105°C.
[0137] The prepared metamaterial structure is a rotating double ring structure, the metamaterial pattern is a rotating double split ring, the rotation a...
Embodiment 2
[0146] This embodiment is basically the same as Embodiment 1, except that:
[0147] In step (4), the substrate is a 300 μm silicon substrate, which is reduced to 150 μm through a substrate thinning process. After the thinning process, it should be boiled in acetone solution for 10 minutes to remove organic contaminants on the surface of the substrate, then boiled with anhydrous ethanol solution for 15 minutes to remove acetone, and finally rinsed with deionized water three times and dried with nitrogen.
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