Plasma generator used for SiC optical mirror finishing and application method thereof
A plasma and optical mirror technology, applied in the direction of plasma, electrical components, etc., can solve the problems of low processing efficiency of ordinary ICP plasma, difficult to adapt to long-term processing, difficulty in maintenance and high cost, so as to improve processing efficiency and Long-term stability, improving the convergence ratio of single machining, and improving efficiency
Inactive Publication Date: 2020-01-10
NAT UNIV OF DEFENSE TECH
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Problems solved by technology
[0004] At present, in terms of plasma processing efficiency, the ordinary ICP plasma processing method can use more power, so the ionization degree of the plasma is higher, the concentration of active particles is higher, and the processing efficiency is higher than that of CCP plasma. At the same time, the existence of no electrode can avoid the pollution of the processed material due to the corrosion of the electrode; however, for SiC, a high-hardness material, the processing efficiency of ordinary ICP plasma is still low
In terms of the structure of ICP plasma generators, ordinary ICP plasma generators use an integrated quartz torch; the integrated quartz torch will be scrapped due to the accumulation of heat during ICP plasma processing, which is difficult to adapt to the long-term Time processing, and maintenance difficulty and cost are high
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[0052] Such as figure 1 , figure 2 , image 3 and Figure 4 As shown, the present embodiment provides a plasma generator for SiC optical mirror processing, including a housing 1 and a combined torch 2 installed in the housing 1, the combined torch 2 includes an outer tube 21 and sequentially nested In the middle pipe 22 and the inner pipe 23 at the inlet end of the outer pipe 21, the middle outer wall of the outer pipe 21 is provided with an inductive coupling coil 24, and the outlet end of the outer pipe 21 is provided with a Laval nozzle 25, between the outer pipe 21 and the middle pipe 22 The gaps form cooling gas inflow channels ( figure 1 shown in middle a), the gap between the middle pipe 22 and the inner pipe 23 forms an excitation gas inflow channel ( figure 1 Shown in b), the inner cavity of the inner tube 23 forms a reaction gas inflow channel ( figure 1 As shown in c), the plasma generator used in this embodiment for SiC optical mirror processing can form an a...
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The invention discloses a plasma generator used for SiC optical mirror finishing and an application method thereof. The plasma generator comprises a shell and a combined torch tube. The combined torchtube comprises an outer tube, a middle tube and an inner tube which are nested successively. An inductive coupling coil sleeves the outer tube. The application method comprises the following steps ofinstalling the plasma generator on a numerical control motion platform with a three-axis linkage function; linearly scanning a surface of a SiC workpiece by using plasmas to obtain a material removalamount of a removal function; obtaining a removal function experiment model by extracting and fitting a section shape of a groove of the material removal amount; and calculating residence time distribution according to the removal function experiment model, and setting a machining path to iteratively process the surface of the SiC workpiece. Maintenance difficulty in an ICP plasma machining process can be reduced, SiC optical mirror surface machining efficiency and long-time stability are improved, and the plasma generator has advantages of high machining efficiency, a simple structure, low cost, convenient maintenance and high and long-time stability.
Description
technical field [0001] The invention relates to the field of optical material manufacturing, in particular to a plasma generator used for SiC optical mirror surface processing and an application method thereof. Background technique [0002] SiC optical materials have good characteristics such as high chemical stability, low density, high strength and elastic modulus, strong radiation resistance, high specific stiffness, small thermal deformation coefficient, and high reflectivity coating. Therefore, SiC mirrors are more and more widely used in space astronomical optics, satellite remote sensing technology and large ground-based optical systems. As the application fields of SiC mirrors become more and more extensive, the increasing demand for SiC mirrors poses new challenges to the efficient processing of SiC mirrors. At present, the traditional processing process of SiC mirrors is rough grinding forming, grinding, modification, polishing and other processes. Before the mod...
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IPC IPC(8): H05H1/28H05H1/30
CPCH05H1/28H05H1/30
Inventor 周林戴作财宋辞
Owner NAT UNIV OF DEFENSE TECH