Scale removal device for water ring vacuum pump in running

A water ring vacuum pump, the technology in operation, applied to the parts, pumps, pump components, etc. of the pumping device used for elastic fluid, can solve the problems of heavy maintenance work, discontinuous production of the system, etc., and achieve the effect of avoiding fouling
CN110735802AInactive Publication Date: 2020-01-31HUBEI SHANSHUI CHEM
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Applications(China)
Current Assignee / Owner
HUBEI SHANSHUI CHEM
Publication Date
2020-01-31
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The invention discloses a scale removal device for a water ring vacuum pump in running. The scale removal device comprises the water ring vacuum pump, the water ring vacuum pump is provided with an air inlet pipe and an emptying port, a branch pipe is furthermore connected to the air inlet pipe, and the other end of the branch pipe is connected to a hydrochloric acid solution storage tank; an adjusting valve is arranged on the branch pipe, a liquid collection tank is arranged at the emptying port, and a pH online monitor is connected to the interior of the liquid collection tank. The water ring vacuum pump is a negative pressure system in the running process, a hydrochloric acid solution enters the air inlet pipe of the water ring vacuum pump through the branch pipe, and is mixed with alkaline water in an alkaline impurity and a gaseous medium for acid-base neutralization through high-speed rotation of an impeller of the water ring vacuum pump, and the alkaline impurity in the water ring vacuum pump can be removed. By means of the scale removal device, the running period of equipment can be prolonged, the operation is simple, and the practicability is high.
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Description

Technical field

[0001] The invention relates to the technical field of water ring vacuum pump descaling, in particular to a water ring vacuum pump descaling device in operation. Background technique

[0002] In chemical production, water ring vacuum pump devices are generally used for gas compression and transportation, such as hydrogen transmission devices in chlor-alkali production and acetylene gas transmission devices in vinyl chloride production. However, since most of these transport media are alkaline gases with moisture and some alkaline impurities, it is very easy to cause impeller fouling in the gas phase system of the water ring vacuum pump, reduce the rotor gap, increase friction, and cause the current of the water ring vacuum pump to rise. , The efficiency drops, and even the load of the water ring vacuum pump increases and causes tripping, leading to production accidents.

[0003] In actual production, to solve the above problems, the system is shut down to switch th...

Claims

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