Copper-clad laminate
A technology of copper clad layer and laminated board, which is applied in coating, sputtering plating, ion implantation plating, etc., and can solve the problems of dry film resist adhesion deterioration and other problems
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Embodiment 1
[0059] Follow the steps below to prepare the substrate. As a base film, a polyimide film (manufactured by Ube Industries, Ltd., Upilex-35SGAV1) having a thickness of 35 μm was prepared. Place the base film in a magnetron sputtering device. A nickel-chromium alloy target and a copper target are set in a magnetron sputtering device. The composition of the nickel-chromium alloy target was 20% by mass of Cr and 80% by mass of Ni. In a vacuum environment, a base metal layer made of nickel-chromium alloy with a thickness of 25 nm was formed on one surface of the base film, and a copper thin film layer with a thickness of 100 nm was formed thereon.
[0060] Next, a copper plating solution was prepared. The copper plating solution contains 120g / L copper sulfate, 70g / L sulfuric acid, 20mg / L leveler component, 1100mg / L polymer component, 16mg / L brightener component, and 50mg / L chlorine component. As a leveler component, a diallyldimethylammonium chloride-sulfur dioxide copolymer (ma...
Embodiment 2
[0064] A copper-clad laminate was obtained in the same manner as in Example 1. However, in the electrolytic plating, the current density was changed so as to include seven jump periods. Other conditions are the same as in Example 1.
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