Self-supporting water electrolysis material with dual carbon sandwich structure and preparation method thereof
A sandwich structure, self-supporting technology, applied in the direction of electrolysis process, electrolysis components, chemical instruments and methods, etc., to achieve the effect of good conductivity, excellent activity, and wide range of applications
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Embodiment 1
[0027] 1. Select carbon paper as the substrate, place it in ultrapure water and ethanol for 60 minutes, and then place it in a vacuum oven to dry at 80°C for 12 hours.
[0028] 2. Dissolve 1.7mg of ammonium molybdate and 7mg of thiourea in 2mL of water, then add 50mg of silicon dioxide (100nm, 30wt.%), stir and mix well, and then sonicate for 60min.
[0029] 3. Take the mixed solution in step 2 and drop-coat it directly on the carbon paper, so that the precursor is evenly loaded on the carbon paper. After drying at room temperature, place it in a vacuum dryer and dry it for 10 hours at a drying temperature of 80°C; Chemical vapor deposition method, the obtained product was transferred to a tube furnace, under an argon atmosphere, the temperature was programmed to rise to 400°C at a rate of 10°C / min, the gas flow rate was 80mL / min, and then kept for 240min.
[0030] 4. Seal the product obtained in step 3 and place it in 50mL hydrofluoric acid solution (10wt.%) for 120min. After...
Embodiment 2
[0033] 1. Select carbon cloth as the substrate, place it in ultrapure water and ethanol for ultrasonic cleaning for 60 minutes, and then dry it in a vacuum oven at 80°C for 12 hours.
[0034] 2. Dissolve 1.7mg of ammonium molybdate and 7mg of thiourea in 2mL of water, then add 50mg of silicon dioxide (100nm, 30wt.%), stir and mix, and then sonicate for 120min.
[0035] 3. Take the mixed solution in step 2 and drop-coat it directly on the carbon cloth, so that the precursor is evenly loaded on the carbon cloth. After drying at room temperature, place it in a vacuum dryer for 10 hours at a drying temperature of 60°C; Chemical vapor deposition method, the obtained product was transferred to a tube furnace, under an argon atmosphere, the temperature was programmed to rise to 400°C at a rate of 10°C / min, the gas flow rate was 80mL / min, and then kept for 240min.
[0036]4. Seal the product obtained in step 3 and place it in 50mL hydrofluoric acid solution (10wt.%) for 120min. After ...
Embodiment 3
[0039] 1. Select carbon felt as the substrate, place it in ultrapure water and ethanol in order to ultrasonically clean it for 60 minutes, and then place it in a vacuum oven at 80°C for 12 hours.
[0040] 2. Dissolve 1.7mg of ammonium molybdate and 7mg of thiourea in 2mL of water, then add 50mg of silicon dioxide (100nm, 30wt.%), stir and mix well, and then sonicate for 80min.
[0041] 3. Take the mixed solution in step 2 and drop-coat it directly on the carbon felt, so that the precursor is evenly loaded on the carbon felt. After drying at room temperature, place it in a vacuum dryer for 10 hours at a drying temperature of 100°C; Chemical vapor deposition method, the obtained product was transferred to a tube furnace, under an argon atmosphere, the temperature was programmed to rise to 400°C at a rate of 10°C / min, the gas flow rate was 80mL / min, and then kept for 240min.
[0042] 4. Seal the product obtained in step 3 and place it in 50mL hydrofluoric acid solution (10wt.%) f...
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