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A kind of chemical warfare agent sensor and preparation method thereof

A chemical warfare agent and sensor technology, applied in the field of sensors, can solve the problems of unsatisfactory large-scale, multi-point delivery, expensive instruments, heavy weight, etc., to achieve easy mass production and large-scale delivery, and improve linearity and repeatability , High miniaturization effect

Active Publication Date: 2022-04-29
TIANJIN SINO GERMAN VOCATIONAL TECHNICAL COLLEGE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the shortcomings of expensive instruments, large volume, heavy weight, and high difficulty in installation and maintenance, it is impossible to carry out portable real-time detection of poisonous agents, and it is not easy to realize integration and miniaturization. Requirements for large-scale, multi-point delivery

Method used

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  • A kind of chemical warfare agent sensor and preparation method thereof
  • A kind of chemical warfare agent sensor and preparation method thereof
  • A kind of chemical warfare agent sensor and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] 1) Pretreatment of the piezoelectric substrate layer: take a 500 μm thick ST-quartz piezoelectric substrate and cut it into a geometric size of 35 cm×10 cm. Ultrasonic cleaning with anhydrous ethanol for 20 minutes; ultrasonic cleaning in dilute ammonia water for 10 minutes at a cleaning temperature of 80°C; ultrasonic cleaning in dilute hydrochloric acid for 10 minutes at a cleaning temperature of 80°C, and finally the ST-quartz piezoelectric substrate in deionized water for 20 minutes , blow dry with nitrogen gas for later use. Described dilute ammonia water is that 27wt% ammonia water and deionized water are ammonia water by volume fraction: deionized water=1:50 is formulated; Described dilute hydrochloric acid solution is 37wt% hydrochloric acid and deionized water is hydrochloric acid by volume fraction: Deionized water = 1:8 prepared.

[0046] 2) Preparation of interdigitated electrodes and / or reflective grid layer: use a vacuum coating machine to vapor-deposit a...

Embodiment 2

[0053] 1) Pretreatment of the piezoelectric substrate layer: take a 300 μm thick 128° Y-X piezoelectric substrate and cut it into a geometric size of 25 cm×10 cm. Ultrasonic cleaning with anhydrous ethanol for 20 minutes; ultrasonic cleaning in dilute ammonia water for 5 minutes at a cleaning temperature of 80°C; ultrasonic cleaning in dilute hydrochloric acid for 5 minutes at a cleaning temperature of 80°C, and finally cleaning the 128°Y-X piezoelectric substrate in deionized water for 20 minutes , blow dry with nitrogen gas for later use. Described dilute ammonia water is that 27wt% ammonia water and deionized water are ammonia water by volume fraction: deionized water=1:50 is formulated; Described dilute hydrochloric acid solution is 37wt% hydrochloric acid and deionized water is hydrochloric acid by volume fraction: Deionized water = 1:8 prepared.

[0054] 2) Preparation of interdigitated electrodes and / or reflective gate layer: Deposit a layer of Cu film with a thickness...

Embodiment 3

[0060] 1) Pretreatment of the piezoelectric substrate layer: take a 550 μm thick PVDF-TrFE piezoelectric substrate and cut it into a geometric size of 50 cm×40 cm. Ultrasonic cleaning with absolute ethanol for 30 minutes; ultrasonic cleaning in dilute ammonia water for 3 minutes at a cleaning temperature of 50°C; ultrasonic cleaning in dilute hydrochloric acid for 3 minutes at a cleaning temperature of 50°C, and finally the PVDF-TrFE piezoelectric substrate was cleaned in deionized water for 20 minutes , blow dry with nitrogen gas for later use. Described dilute ammonia water is that 27wt% ammonia water and deionized water are ammonia water by volume fraction: deionized water=1:50 is formulated; Described dilute hydrochloric acid solution is 37wt% hydrochloric acid and deionized water is hydrochloric acid by volume fraction: Deionized water = 1:8 prepared.

[0061] 2) Preparation of interdigitated electrodes and / or reflective grid layer: use screen printing technology to prin...

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Abstract

The invention discloses a surface acoustic wave type chemical warfare agent sensor structure and a preparation method based on molecular imprint recognition technology. The sensor uses a surface acoustic wave single-ended resonator, double-ended resonator or delay line as a converter, and uses a porous polymer film embedded with chemical warfare agent simulating agent template molecules as a sensitive layer to achieve specificity for chemical warfare agents detection. The present invention has the advantage that template molecules can be fixed in the three-dimensional network structure of the porous polymer sensitive membrane during the preparation of the sensitive membrane; the sensitive membrane is further pretreated to remove the template molecules from the sensitive membrane to form a The template imprints a hole with a matching molecular spatial configuration and multiple action sites, and the hole has a specific selection and recognition ability for the corresponding chemical warfare agent. The sensor has high sensitivity, good selectivity, strong anti-interference ability, convenient operation, simple process, suitable for large-scale production and large-scale delivery, and is compatible with Internet of Things technology.

Description

technical field [0001] The invention belongs to the technical field of sensors, and in particular relates to a surface acoustic wave chemical warfare agent sensor based on molecular imprint recognition technology and a preparation method thereof. Background technique [0002] In recent years, the international situation has been relatively stable, and no large-scale world war has occurred, but local wars and terrorist attacks continue, and the threat of chemical weapons to mankind has never stopped. Chemical warfare agents are the main components of chemical weapons. They are highly toxic compounds that can quickly disable the enemy's ability to resist or directly kill them. [0003] For the detection of specific substances such as sarin gas, the sensitivity, selectivity and anti-interference ability of the sensor are all crucial technical indicators. When there is a poisonous gas disaster, the sensor can respond in time, which can reduce the harm to people’s lives and prop...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N29/02G01N29/24
CPCG01N29/022G01N29/2437G01N2291/022
Inventor 徐晟张瑞韩健赵旭李扬崔俊鹏胡晓光
Owner TIANJIN SINO GERMAN VOCATIONAL TECHNICAL COLLEGE
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