Metal wire grating polarizer with deep ultraviolet composite structure

Abstract

The invention discloses a metal wire grating polarizer with a deep ultraviolet composite structure. The metal wire grating polarizer comprises a substrate, a metal grating with a groove and a medium filling structure, wherein the metal grating and the medium filling structure have the same period P of 100-300nm, the duty ratio W/P of the metal grating is 0.5-0.85, and the height-width ratio H/W ofthe metal grating is 1-3. By reducing the generation of metal and dielectric interface surface plasmas, the inhibition effect of the metal and dielectric interface surface plasmas on TM polarized light is reduced, and the TM polarization transmittance and extinction ratio are increased. The metal wire grating polarizer has the characteristics of large period, simple manufacturing process, high polarization transmittance, high extinction ratio and the like in the deep ultraviolet band. The device is compact in structure and easy to integrate, the polarization detection system serving as a polarization analyzer does not need a collimating optical system, the detection system can be effectively simplified, the polarization detection system is miniaturized and wide in application range, and the device has important application value in the polarization detection system of the deep ultraviolet lithography machine.

Description

technical field [0001] The invention relates to the technical field of polarizers, in particular to a deep ultraviolet compound structure metal wire grid polarizer with an operating wavelength of 193nm. Background technique [0002] As the lithography process node has reached 14nm, 10nm and lower, the step-scan projection lithography machine used in lithography must use a high numerical aperture projection objective lens and a polarization illumination subsystem. The influence of the high numerical aperture projection objective lens and the polarization parameters of the illumination subsystem of the lithography machine on the quality of lithography imaging and illumination cannot be ignored, and the influence becomes more and more significant as the process node decreases. The premise of effectively adjusting the polarization parameters of the projection objective lens and the illumination subsystem is to achieve high-precision measurement of the polarization parameters of ...

AI Technical Summary

Problems solved by technology

The wire grid polarizer used in the ultraviolet band in the above article often cannot take into account the high extinction ratio and the large grating period. The extinction ratio is often improved by reducing the characteristic size of the wire grid so that the grating only generates zero-order diffracted light, and the affected The limitation of nanotechnology makes the processing difficulty greatly increased

[0004] The common problem with the above wire grid polarizers used in the deep ultraviolet band is that they usually only use the zero-order diffraction of the grating, and obtain higher polarization transmittance and extinction ratio by constraining the grating period to be much smaller than the incident wavelength

For the deep ultraviolet band, the restriction conditions of the grating period are more stringent, the small grating period makes the processing difficult and the production cost is high, and most studies only consider the case of vertical incidence, and do not consider the stability of the polarization performance in the case of large-angle incidence

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