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Electro-optic modulator and manufacturing method thereof

An electro-optical modulator, metal electrode technology, applied in instruments, optics, nonlinear optics, etc., can solve problems such as microwave loss, achieve high-efficiency electric field loading, solve microwave loss, and improve modulation characteristics.

Active Publication Date: 2021-09-21
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of this, the purpose of the invention of the present invention is: how to solve the problem of microwave loss caused by electrode spacing

Method used

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  • Electro-optic modulator and manufacturing method thereof
  • Electro-optic modulator and manufacturing method thereof
  • Electro-optic modulator and manufacturing method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] figure 1 It is a schematic flow chart of a manufacturing method of an electro-optic modulator according to an embodiment of the present invention, the method comprising:

[0021] Step 11, forming a low dielectric constant substrate;

[0022] The low dielectric constant substrate is quartz crystal with a thickness ranging from 100um to 500um.

[0023] Step 12, depositing a low dielectric constant bonding layer on the surface of the low dielectric constant substrate;

[0024] The low dielectric constant bonding layer is a silicon dioxide layer or a benzocyclobutene (BCB) layer with a thickness ranging from 2um to 10um.

[0025] Step 13, bonding and peeling off the lithium niobate crystal layer and the bonding layer to form a lithium niobate thin film layer; and etching the lithium niobate thin film layer to form a lithium niobate waveguide structure;

[0026] Wherein, the thickness of the lithium niobate thin film layer ranges from 400nm to 800nm. When etching the lit...

Embodiment 2

[0039] Figure 4 It is a schematic flow chart of the manufacturing method of the second electro-optic modulator of the present invention, combined below Figure 4a to Figure 4e The specific structural schematic diagram in the method preparation is described in detail. The method includes:

[0040] Step 41, such as Figure 4a As shown, a low dielectric constant substrate 200 is formed;

[0041] The low dielectric constant substrate is quartz crystal with a thickness ranging from 100um to 500um.

[0042] Step 42, such as Figure 4b As shown, a low dielectric constant bonding layer 201 is deposited on the surface of the low dielectric constant substrate;

[0043] The low dielectric constant bonding layer is a silicon dioxide layer or a benzocyclobutene (BCB) layer with a thickness ranging from 2um to 10um.

[0044] Step 43, such as Figure 4cAs shown, the lithium niobate crystal layer and the bonding layer are bonded and peeled off to form a lithium niobate thin film layer...

Embodiment 3

[0052] Figure 5 It is a schematic flow chart of a method for manufacturing an electro-optic modulator according to Embodiment 3 of the present invention, and the method includes:

[0053] Step 51, forming a low dielectric constant substrate 200;

[0054] The low dielectric constant substrate is quartz crystal with a thickness ranging from 100um to 500um.

[0055] Step 52, depositing a low dielectric constant bonding layer 201 on the surface of the low dielectric constant substrate;

[0056] The low dielectric constant bonding layer is a silicon dioxide layer or a benzocyclobutene (BCB) layer with a thickness ranging from 2um to 10um.

[0057] Step 53, removing the low dielectric constant bonding layer below the effective modulation region of the lithium niobate waveguide structure to form a bonding layer 201';

[0058] When the bonding layer is a silicon dioxide layer, dry etching or wet etching is used to remove the low dielectric constant bonding layer below the effectiv...

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Abstract

The invention discloses an electro-optic modulator and a manufacturing method thereof. The electro-optic modulator comprises a low-permittivity bonding layer arranged in sequence from bottom to top on a low-permittivity substrate, a lithium niobate waveguide structure, and a microwave Coplanar waveguide transmission lines are based on periodic metal electrodes formed by loading. Adoption of the present invention can reduce the microwave loss caused by the distance between electrodes.

Description

technical field [0001] The invention relates to the technical field of optical communication devices, in particular to an electro-optical modulator and a manufacturing method thereof. Background technique [0002] Optical fiber communication is one of the main pillars of modern communication. With the explosive growth of data communication services, people have put forward higher and higher requirements for communication bandwidth. The single-wavelength bandwidth of the current optical fiber communication system is moving from 2.5Gb / s and 10Gb / s to higher bandwidth. Loading information to the laser is divided into internal modulation and external modulation. The chirp caused by the internal modulation is relatively large, and its transmission distance is limited due to the dispersion effect of the optical fiber, and the modulation bandwidth is not high. External modulation mainly includes electro-absorption amplitude modulator and electro-optic phase modulator. The inheren...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/03G02F1/035
CPCG02F1/0305G02F1/0316G02F1/035
Inventor 罗毅刘学成熊兵孙长征郝智彪
Owner TSINGHUA UNIV
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