GaN/rGO-based infrared position sensor and preparation method and detection method
A detection method and sensor technology, applied in the field of photoelectric sensors, can solve the problems of high cost, inability to detect, complex process, etc., and achieve the effects of low production cost, broadened application range, and simple structure and production process
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[0034] Embodiment 1: This embodiment provides a preparation and detection method of an infrared photoelectric position sensor based on GaN / rGO, wherein GO is graphene oxide, rGO is redox graphene, and a 1550nm infrared laser is used as the light source, and the spot size is 2 Micron, the implementation process is as follows:
[0035] First, the GaN substrate 1 on the Ga surface or the N surface is cut and grown into a strip structure of 30mm and 2mm in width, and ultrasonically cleaned with acetone reagent, isopropanol, and deionized water for 15 minutes in sequence, and then the substrate is dried with high-pressure nitrogen gas. bottom surface.
[0036] Using a mask plate and electron beam evaporation or thermal evaporation, the multilayer metal Ti / Al / Ni / Au is sequentially plated on both ends of the GaN strip substrate as the ohmic contact electrode 2, with a total thickness of about 100nm. The distance is 25mm.
[0037] Add a 0.22 μm fiber filter membrane to the vacuum fi...
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