Silicon-based negative electrode material and preparation method thereof, lithium ion battery
A technology of silicon-based negative electrode materials and silicon substrates, applied in the direction of negative electrodes, battery electrodes, secondary batteries, etc., can solve the problems of loss of electrochemical activity, inactivation of negative electrode active materials, cycle deterioration, etc., to improve charge and discharge cycles ability, suitable for industrial production, and the effect of improving service life
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[0053] An embodiment of the present application provides a method for preparing a silicon-based negative electrode material, comprising: passing a carbon source material through a pre-decomposition zone in a non-oxidizing atmosphere to form a decomposition product, wherein the carbon source material includes a gaseous carbon source material, Vaporizing one or more of the carbon source material or atomizing the carbon source material; regulating and controlling the flow velocity V at which the decomposition product enters the reaction chamber of the deposition coating area G And the molar flow rate of the decomposition product and the base material mass ratio Mc / M, so that the silicon base material and the decomposition product undergo a deposition coating reaction in the deposition coating area, forming an amorphous carbon coating layer and graphite on the surface of the silicon base material A carbonized coating layer, the amorphous carbon coating layer or the graphitized carb...
Embodiment 1
[0079] Using a rotary furnace including a pre-decomposition area and a deposition coating area, select 1 kg of silicon oxide SiOx (x=0.9) with a median particle size of 5 μm as the silicon base material, and use nitrogen as a protective gas to feed a flow rate in the pre-decomposition area V G =1m / min mixture of ethane gas and ethanol vapor, wherein the molar ratio of ethane and ethanol is 1:1, the reaction temperature is 900 degrees Celsius, adjust M c / M=0.25mol / min, pass into the deposition coating area of the rotary furnace, the temperature of the deposition coating area is 900°C, and the total reaction time is 20 min, to form the silicon-based negative electrode material S1-1.
[0080] Continue to react the above S1-1 material at the same temperature, and pass V G =10m / min methane and ethylene mixed gas, wherein the volume ratio of methane and ethylene is 3:1, control M c / M=0.05, the reaction time is 120min, and the silicon-based negative electrode material S1-2 is f...
Embodiment 2
[0084] Using the same equipment as in Example 1, the oxide SiOx (x=0.9) 1kg of silicon oxide SiOx (x=0.9) 1kg with a median particle size of 8 μm is selected as the silicon base material, and nitrogen is used as the protective gas, and the flow rate V is passed into the pre-decomposition zone. G =10m / min methane and ethylene mixed gas, wherein the methane and ethylene volume ratio is 3: 1, the reaction temperature is 900 degrees Celsius, adjust Mc / M=0.05mol / min, pass into the deposition coating area of the rotary furnace, deposit The temperature of the coating area is 900° C., and the total reaction time is 120 minutes to form the silicon-based negative electrode material S2-1.
[0085] Continue to react the above S2-1 material at the same temperature, pass V G =1m / min ethane gas and ethanol vapor mixture, wherein the molar ratio of ethane and ethanol is 1:1, control M c / M=0.25, the reaction time is 10 minutes, and the silicon-based negative electrode material S2-2 is form...
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