Anti-inflammatory moisturizing facial mask suitable for sensitive skin

A skin-sensitive technology, applied in the directions of anti-inflammatory agents, skin care preparations, cosmetic preparations, etc., can solve the problem of scarcity of masks, and achieve the effects of lower price, high solubility and simple synthesis

Inactive Publication Date: 2020-06-05
罗玲艳
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a kind of anti-inflammatory moisturizing mask that can be used for sensitive skin to solve the problem that the mask suitable for sensitive skin is very rare in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] In No. ① reactor, first mix deionized water (58.15kg), benzethonium chloride 0.5kg, and triethanolamine (0.1kg) with a weight percentage of 99%, heat it to 60°C with high-speed stirring, and slowly add hydroxyethyl cellulose 0.05kg, and stirred at constant temperature until a transparent and uniform gel was obtained. In No. ② reactor, at room temperature, 94125 kg of carbomer resin 98% by weight, 7.5 kg of polydextrose and 5.0 kg of aloe vera gel were mixed at room temperature, and then added to No. ① reactor cooled to 55°C. When it is thick, use a scraper to stir, add the pre-mixed triethanolamine (0.5kg) and deionized water (1kg) into the reactor No. Add 0.1kg, 0.1kg of phenoxyethanol and deionized water (5kg) into the reaction kettle ①, cool to 25°C, and fill.

Embodiment 2

[0018] In the No. ① reactor, first mix deionized water (54kg), benzethonium chloride 0.1kg, and triethanolamine (0.02kg) with a weight percentage of 99%, heat it to 65°C with high-speed stirring, and slowly add hydroxyethyl cellulose 0.01kg, and stirred at constant temperature until a transparent and uniform gel was obtained. In No. ② reactor, mix 20kg Carbopol resin 940, 2kg polydextrose and 1kg aloe vera gel at room temperature, and then add it to No. ① reactor cooled to 60°C. When the material thickens, use a scraper to stir , the pre-mixed weight percentage is 99% triethanolamine (0.08kg) and deionized water (1kg) into the reactor No. kg, 0.01kg of phenoxyethanol and deionized water (5kg) were added to the reaction kettle ①, cooled to 23°C, and filled.

Embodiment 3

[0020] In the reactor No. ①, first mix deionized water (62kg), benzethonium chloride 1kg, and triethanolamine (0.4kg), stir at high speed and heat to 70°C, slowly add 0.1kg of hydroxyethyl cellulose, and stir at constant temperature to obtain A transparent and homogeneous gel. In No. ② reactor, at room temperature, mix 30kg of Carboresin 934 98% by weight, 12kg of polydextrose and 10kg of aloe vera gel at room temperature, and then add it to No. ① reactor cooled to 57°C. When the material thickens When stirring with a scraper, add the pre-mixed triethanolamine (0.6kg) and deionized water (2kg) into the reactor No. kg, 0.5kg of phenoxyethanol and deionized water (6kg) were added to the reaction kettle ①, cooled to 25°C, and filled.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides an anti-inflammatory moisturizing facial mask suitable for sensitive skin. The anti-inflammatory moisturizing facial mask is prepared from the following raw materials in parts by weight of 60-70 parts of deionized water, 0.1-1 part of benzethonium chloride, 0.1-1 part of triethanolamine, 0.01-0.1 part of hydroxyethyl cellulose, 20-30 parts of Carfopol resin, 1-10 parts of aloe glue, 2-12 parts of polydextrose, 0.01-0.5 part of ethylenediamine tetraacetic acid disodium salt and 0.01-0.5 part of phenoxetol. The facial mask is non-irritating to skin; the polydextrose is creatively added, has the effect of moisturizing, is broad in source and simple in synthesis, and replaces collagen in an original facial mask, so that the price of the facial mask for moisturizing is effectively reduced; the polydextrose can enable the facial mask to have the effect of refreshing and cannot enable a user to generate sticky and greasy feeling; and the polydextrose has the efficacy ofbalancing blood osmotic pressure, diminishing inflammation and sterilizing.

Description

technical field [0001] The invention relates to an anti-inflammatory moisturizing facial mask suitable for sensitive skin. Background technique [0002] Mask is a commonly used item for modern women, usually with whitening, moisturizing, anti-inflammatory and other effects. Ordinary facial masks are usually composed of water, preservatives, antioxidants, moisturizers, surfactants and other special ingredients. [0003] With the development of society, people add drugs and certain ingredients to the mask, adding many new functions to the mask. In order to moisturize, collagen is added to the mask. Active collagen has strong permeability to the skin and can penetrate the cutin Combined with skin epithelial cells, it participates in and improves the metabolism of skin cells. It can keep the stratum corneum moisture, enhance blood circulation, and achieve the purpose of moisturizing the skin. However, most of the collagen on the market is obtained through enzymatic cutting of...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/73A61Q19/00A61Q17/00A61P29/00
CPCA61K8/73A61P29/00A61Q17/005A61Q19/00A61Q19/005
Inventor 不公告发明人
Owner 罗玲艳
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products