Unlock instant, AI-driven research and patent intelligence for your innovation.

Acid etching solution and acid etching treatment method for titanium implants

A treatment method and implant technology, which are applied in the field of acid etching solution and acid etching treatment of titanium implants, can solve problems such as poor surface quality of titanium implants, increase the effective area of ​​etching and improve the wetting effect. , to avoid the effect of polluting the environment

Active Publication Date: 2022-03-29
广东安特齿科有限公司
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the related art, the surface quality of titanium implants obtained after acid etching process is often poor

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0073] By weight, the acid etching solution contains: 30 parts of sulfuric acid with a mass fraction of 50%, 10 parts of titanium chloride with a mass fraction of 40%, 2 parts of sodium lauryl sulfate, 3 parts of organic heterocyclic corrosion inhibitor and water 25 servings.

[0074] First, configure the etching solution according to the above ratio, and place the prepared etching solution in the etching tank for use. At the same time, high-temperature steam is used to clean the surface of the titanium implant to be etched to remove surface oil and obtain a clean titanium implant. Then put the clean titanium implant into the etching solution in the etching tank, and perform ultrasonic treatment for 60 minutes at a temperature of 80° C., then take it out, clean and dry it. Finally, the acid etching solution after acid etching is subjected to aging treatment, and then filtered to obtain titanium dioxide and the acid etching solution for reuse.

Embodiment 2

[0076] In parts by weight, the etching solution contains: 45 parts of sulfuric acid with a mass fraction of 60%, 15 parts of sodium chloride with a mass fraction of 50%, 3 parts of sodium lauryl sulfate, 3 parts of nitrite, ethylenediamine tetra 2 parts of acetic acid, 3 parts of alkylsulfonate and 35 parts of water.

[0077] First, configure the etching solution according to the above ratio, and place the prepared etching solution in the etching tank for use. At the same time, high-temperature steam is used to clean the surface of the titanium implant to be etched to remove surface oil and obtain a clean titanium implant. Then put the clean titanium implant into the etching solution in the etching tank, and perform ultrasonic treatment for 80 minutes at a temperature of 100° C., then take it out, clean and dry it. Finally, the acid etching solution after acid etching is subjected to aging treatment, and then filtered to obtain titanium dioxide and the acid etching solution f...

Embodiment 3

[0079] In parts by weight, the etching solution contains: 55 parts of sulfuric acid with a mass fraction of 60%, 35 parts of sodium chloride with a mass fraction of 60%, 2 parts of ethylene glycol n-butyl ether, 3 parts of nitrite, ethylenediaminetetraacetic acid 3 parts, 4 parts of alkylsulfonate, 3 parts of aminotetrazole compound, 2 parts of formamide, 3 parts of sulfamic acid, 2 parts of butynediol and 45 parts of water.

[0080] First, configure the etching solution according to the above ratio, and place the prepared etching solution in the etching tank for use. At the same time, high-temperature steam is used to clean the surface of the titanium implant to be etched to remove surface oil and obtain a clean titanium implant. Then put the clean titanium implant into the etching solution in the etching tank, and perform ultrasonic treatment for 90 minutes at a temperature of 110° C., then take it out, clean and dry it. Finally, the acid etching solution after acid etching...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
pore sizeaaaaaaaaaa
pore sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses an acid etching solution and an acid etching treatment method for a titanium implant. Wherein, by weight, the acid etching solution contains: sulfuric acid, 30-80 parts; chlorine salt, 5-40 parts; surfactant, 1-5 parts; corrosion inhibitor, 1-5 parts; and water, 20 parts ‑60 servings. The technical scheme of the invention can improve the surface quality of the titanium implant obtained after the acid etching process.

Description

technical field [0001] The invention relates to the technical field of surface treatment of titanium implants, in particular to an acid etching solution and an acid etching treatment method for titanium implants. Background technique [0002] At present, titanium implants (such as dental implants, intraosseous implants, etc.) are mainly made of pure titanium or titanium alloys, and the surface roughness is improved by sandblasting and acid etching to form a microstructure. In the related art, the surface quality of the titanium implant obtained after the acid etching process is often poor. [0003] The above content is only used to assist in understanding the technical solution of the present invention, and does not mean that the above content is admitted as prior art. Contents of the invention [0004] The main purpose of the present invention is to provide an acid etching solution and an acid etching treatment method for titanium implants. The purpose is to improve the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/26C23F1/46
CPCC23F1/26C23F1/46
Inventor 王五星
Owner 广东安特齿科有限公司