Polyaniline-based ammonia gas sensor with moisture resistance and productionmethod thereof

An ammonia gas sensor, polyaniline-based technology, applied in instruments, material resistance, scientific instruments, etc., to achieve the effects of small size, strong practicability and low processing cost

Active Publication Date: 2020-08-04
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF12 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the research on using the structure of the gas-sensitive material itself to achieve moisture resistance is still at a relatively preliminary stage.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polyaniline-based ammonia gas sensor with moisture resistance and productionmethod thereof
  • Polyaniline-based ammonia gas sensor with moisture resistance and productionmethod thereof
  • Polyaniline-based ammonia gas sensor with moisture resistance and productionmethod thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] This embodiment provides a polyaniline-based ammonia sensor with moisture resistance, including a substrate 1, an interdigital electrode 2, a hygroscopic film 3 arranged on the surface of the interdigital electrode 2, and a hygroscopic film formed on the surface of the hygroscopic film 3. Polyaniline film4.

[0035] Wherein, the hygroscopic film 3 is a material with hygroscopic properties and a large specific surface area, and the hygroscopic film 3 is selected from MXene materials, graphene oxide or two-dimensional transition metal sulfides.

[0036] The polyaniline film 4 is formed by polymerizing on the surface of the hygroscopic film 3 by means of chemical oxidation polymerization. The polyaniline film 4 itself has porosity, and the size and density of the grids in its spatial grid structure can be controlled by adjusting polymerization parameters (such as temperature, concentration, etc.).

[0037] The substrate 1 is selected from polyimide film (PI), polyethylene...

Embodiment 2

[0040] This embodiment provides a method for preparing a polyaniline-based ammonia gas sensor with moisture resistance, comprising the following steps:

[0041] (1) Cut the flexible PI substrate into a suitable size, wash it with deionized water, acetone, ethanol, and deionized water, dry it naturally, and prepare gold interdigitated electrodes on the surface of the substrate by thermal evaporation.

[0042] (2) Niobium carbide (Nb 2 CT x ) film, wherein the preparation process of the niobium carbide dispersion is as follows: 1g carbon aluminum niobium (Nb 2 AlC) is added in the hydrofluoric acid solution of 40wt%, then ultrasonic 48h in the water-bath environment of 50 ℃, after the deionized water washes, the precipitate is soaked in 25wt% tetrapropylammonium hydroxide (TPAOH) for 72h, finally After washing and drying with deionized water, it was dispersed in N-methylpyrrolidone (NMP) solvent.

[0043] (3) Soak the devices prepared in process (2) in 1% polydiallyldimethyla...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a polyaniline-based ammonia gas sensor with moisture resistance and relates to the technical field of gas sensors and electronic polymer sensitive materials. The sensor comprises a substrate, an interdigital electrode, a hygroscopic film arranged on the surface of the interdigital electrode, and a polyaniline film formed by growing on the surface of the hygroscopic film, and the invention also discloses a prodcution method of the ammonia gas sensor. In the invention, the polyaniline film formed by polymerization has a porous grid structure; air permeability is combinedwith hygroscopicity of a lower-layer functional material; and an additional humidity compensation and dehumidification device is not needed, gas sensitivity does not need to be sacrificed while an influence of the humidity on the gas sensitivity of the sensor is reduced, the influence of the humidity on the sensor is greatly decreased, application limitation of the sensor in aspects of atmosphericenvironment, respiration detection and the like is solved, and good practicability is possessed.

Description

technical field [0001] The invention relates to the technical field of gas sensors and electronic polymer sensitive materials, in particular to a polyaniline ammonia gas sensor with moisture resistance and a preparation method thereof. Background technique [0002] Gas sensors are widely used in military, meteorological, agricultural, industrial, medical, construction, etc., and are closely related to human daily life. It has been 60 years since the research on gas sensors. However, a large number of environmental and material factors restrict the large-scale practical use of gas sensors. Among them, the environmental humidity has a very serious impact on the sensor. It not only easily invades the conversion circuit of the sensor and shortens the working life of the device, but more importantly, humidity is also a selective interference item of the gas sensor. The large change of the environmental humidity ( Such as applied in breathing application test) will reduce the con...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/12C08G73/02
CPCC08G73/0266G01N27/126
Inventor 太惠玲王斯刘勃豪蒋亚东袁震赵秋妮张亚杰段再华谢光忠
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap