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Photocuring material for 3D printing

A light-curing material and 3D printing technology, applied in the field of 3D printing materials, can solve problems such as poor anti-aging performance, inability to apply end products, and poor fatigue resistance, and achieve good damping, high hardness, and improved mechanical strength.

Active Publication Date: 2020-08-28
广东省瑞晟新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The materials used in SLA / DLP 3D molding technology are all liquid light-curable resins, which are cured by radiation under specific wavelengths of light energy, and the liquid photosensitive resin becomes a solid cross-linked structure. The material is essentially a thermosetting plastic material, and has a higher Structural materials have higher crosslink density, have hard and brittle natural defects, poor fatigue resistance, poor aging resistance, and cannot be applied to end products

Method used

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  • Photocuring material for 3D printing
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  • Photocuring material for 3D printing

Examples

Experimental program
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Effect test

preparation example Construction

[0024] In the light-curing material for 3D printing according to the present invention, the preparation method of the modified carbon nanotube / calcium phosphosilicate composite powder may include the following steps: 1) adding calcium nitrate with a molar concentration of 0.1-1mol Sodium silicate solution per L, diamine hydrogen phosphate solution with a molar concentration of 0.1-1mol / L, and modified carbon nanotubes are put into the reactor in sequence, with a weight ratio of 1:10:10:0.1; 2) Start the reactor With a stirring device, the meter drips ammonia water at a rate of 0.5L / min, keeps the pH of the solution at 8-9, and continues to stir for 16-17 hours, then removes the filtrate by filtration, and thoroughly washes it with deionized water and absolute ethanol in turn. Wash the residual solid, filter it dry, and then dry it under vacuum at 100°C to obtain the billet; 3) Put the billet into a vacuum furnace with a vacuum degree of 1Mpa, calcining at 600-700°C for 2-2.5 ho...

Embodiment 1

[0038] 1) Immerse the carbon nanotubes in concentrated nitric acid and heat for 10h at a temperature of 150°C, filter,

[0039] Wash with deionized water until the pH is 6, dry in vacuum at 100°C for 3 hours, cool naturally, and grind to obtain carbon oxide nanotubes; Ethoxysilane, stirred at 80°C for 2h, filtered through a Φ0.45μm polytetrafluoroethylene membrane, washed with absolute ethanol, and vacuum-dried at 120°C to obtain modified carbon nanotubes.

[0040] 2) Put calcium nitrate, sodium silicate solution with a molar concentration of 0.1mol / L, diamine hydrogen phosphate solution with a molar concentration of 0.1mol / L, and modified carbon nanotubes into the reactor in sequence, with a weight ratio of 1:10 :10:0.1; start the stirring device of the reactor, the meter drips ammoniacal liquor at a speed of 0.5L / min, keeps the pH of the solution at 8, and continues to stir for 16 hours, then filters and removes the filtrate, and uses deionized water and Fully wash the resi...

Embodiment 2

[0045] 1) Immerse the carbon nanotubes in concentrated nitric acid and heat for 10 hours at a temperature of 150°C, filter, wash with deionized water until the pH is 7, vacuum dry at 100°C for 3 hours, cool naturally, and grind to obtain oxidized carbon nanotubes; 2) the Add oxidized carbon nanotubes to the ethanol solution, then add 3-aminopropyltriethoxysilane dropwise, stir at 80°C for 5h, filter through a Φ0.45μm polytetrafluoroethylene membrane, wash with absolute ethanol, and vacuum dry at 120°C , to obtain modified carbon nanotubes.

[0046] 2) Put calcium nitrate, sodium silicate solution with a molar concentration of 1mol / L, diamine hydrogen phosphate solution with a molar concentration of 1mol / L, and modified carbon nanotubes into the reaction kettle in sequence, with a weight ratio of 1:10:10 : 0.1; start the stirring device of the reactor, the meter drips ammoniacal liquor with the speed of 0.5L / min, keeps the pH of the solution to be 9, and continues to stir for 1...

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Abstract

The invention provides a photocuring material for 3D printing. The photocuring material comprises, by weight, 20 to 40 percent of a photocuring oligomer, 5 to 30 percent of a reactive diluent, 0.1 to1 percent of a photoinitiator, 1 to 10 percent of a thixotropic accelerant and 20 to 50 percent of modified carbon nanotube / calcium phosphosilicate composite powder. The photocuring material disclosedby the invention can smoothly realize a 3D printing process based on an SLA / DLP principle; a prepared product has a low volume shrinkage rate of 0.1 to 0.2 percent; the material is high in mechanicalstrength and good in toughness, the tensile strength ranges from 100 MPa to 120 MPa, the bending strength ranges from 120 MPa to 130 MPa, the breaking elongation ranges from 15% to 20%; after an outdoor weather resistance test is conducted for six months, the mechanical performance index is kept between 98% and 100%, and the material can be used as a terminal product material.

Description

technical field [0001] The invention relates to 3D printing materials, in particular to a photocurable material for 3D printing. Background technique [0002] 3D printing is a method of manufacturing solid three-dimensional objects by superimposing liquid (powder) materials layer by layer with the help of computer-aided design and control. DLP) has the best molding accuracy. The materials used in SLA / DLP 3D molding technology are all liquid light-curable resins, which are cured by radiation under specific wavelengths of light energy, and the liquid photosensitive resin becomes a solid cross-linked structure. The material is essentially a thermosetting plastic material, and has a higher Structural materials have higher crosslink density, have hard and brittle natural defects, poor fatigue resistance, poor aging resistance, and cannot be applied to end products. Contents of the invention [0003] In view of the problems existing in the background technology, the object of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F265/06C08F283/06C08F283/12C08F220/06C08F220/20C08F220/28C08F220/40C08F2/44C08F2/48C08K9/06C08K3/04C08K3/34C08K7/26B33Y70/10
CPCC08F265/06C08F283/065C08F283/124C08F2/44C08F2/48C08K9/06C08K3/041C08K3/34C08K7/26B33Y70/10C08K2003/265C08K2201/011C08F220/20C08F220/40C08F220/06C08F220/281
Inventor 刘斌王贵申俊豪
Owner 广东省瑞晟新材料科技有限公司