Nanoneedle array as well as preparation method and application thereof

A nano-needle and array technology, applied in the field of nano-needle array and its preparation, can solve the problems of difficult adjustment of nano-pillar size parameters, limited size of nano-needle array, small preparation area, etc., and achieves large aspect ratio, stable related parameters, Good controllability of process conditions

Active Publication Date: 2020-11-17
深圳市安瑞生物科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention is to overcome the above-mentioned deficiencies of the prior art, and provide a nanoneedle array and its preparation method, aiming at solving the existing problems in the existing nanoneedle array preparation method that the size parameters of nanopillars are difficult to adjust, the preparation area is small, and the mass production is difficult. , the technical problems of etching and growing nanoneedle arrays with limited size and poor controllability

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  • Nanoneedle array as well as preparation method and application thereof
  • Nanoneedle array as well as preparation method and application thereof
  • Nanoneedle array as well as preparation method and application thereof

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preparation example Construction

[0040] On the one hand, the embodiment of the present invention provides a method for preparing a nanoneedle array. The process flow of the preparation method of the nanoneedle array is as follows: figure 1 and figure 2 As shown, it includes the following steps:

[0041] S01: forming a substrate film layer 11 to be etched on the surface of the substrate 01;

[0042] S02: forming a mask layer 12 for etching nanoneedle array patterns on the surface of the substrate film layer 11 to be etched away from the substrate;

[0043] S03. Etching treatment on the surface of the substrate film layer 11 to be etched containing the mask layer 12: from the direction of the mask layer 12 to the substrate 01, the substrate layer 11 on which the mask layer 12 is formed is etched. Etching the surface of the substrate film layer 11 to perform a first etching treatment to form a nano-column array;

[0044] S04. Carrying out the etching treatment of the tip structure 14 on the top of the nanoc...

Embodiment 1

[0082] This embodiment provides a diamond nanoneedle array and a preparation method thereof. The process flow of the diamond nanoneedle array preparation method is as follows: figure 1 and 2 , which includes the following steps:

[0083] S11. Depositing a diamond film layer 11 on the surface of the substrate by microwave plasma chemical vapor deposition:

[0084] a. Substrate 01 pretreatment: ultrasonically clean the monocrystalline silicon substrate in acetone and alcohol for 10 minutes, and then use H 2 o 2 :NH 3 OH:H 2 O (10:10:50) solution was heated to 80°C, kept for 10 minutes, and deionized water was ultrasonically cleaned for 10 minutes; then the cleaned silicon substrate was placed in a stable nano-diamond powder suspension and ultrasonically treated for 1 hour, and the diamond powder was suspended The average particle size of the liquid is 5nm, it exists in the most dispersed form, the Zeta potential is about +50mV, and the diamond nucleation density exceeds 10...

Embodiment 2

[0097] This embodiment provides a diamond nanoneedle array and a preparation method thereof. The process flow of the diamond nanoneedle array preparation method is as follows: figure 1 and 2 , which includes the following steps:

[0098] S11. Depositing a diamond film layer 11 on the surface of the substrate by microwave plasma chemical vapor deposition:

[0099] a. Substrate 01 pretreatment: carry out with reference to step a in step S11 of embodiment 1;

[0100] b. Depositing a diamond film layer 11 on the substrate: carry out with reference to step b in step S11 of embodiment 1;

[0101] S12. Polishing the diamond film layer 11:

[0102] Carry out with reference to step S12 of embodiment 1;

[0103] S13. Forming the mask layer 12 by electron beam lithography technology:

[0104] In order to promote the adhesion between the electron beam resistance and the substrate, 10nm Ti was evaporated onto the diamond thin film substrate; then, the high-resolution electron beam resi...

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Abstract

The invention provides a nanoneedle array as well as a preparation method and application thereof. The preparation method of the nanoneedle array comprises the following steps: forming a to-be-etchedsubstrate film layer on the surface of a substrate; forming a mask layer for etching a nanoneedle array on the surface of the to-be-etched substrate film layer; performing first etching treatment on the surface of the to-be-etched substrate film layer with the mask layer in the direction from the mask layer to the substrate to form a nano-column array; and carrying out second etching treatment onthe top ends of the nanorods in the nanorod array to form a tip structure at the top ends of the nanorods so as to form a nanoneedle array. The nanoneedle contained in the nanoneedle array comprises ananoneedle body, and the head of the nanoneedle body is of a tip structure.

Description

technical field [0001] The invention belongs to the technical field of micro-nano biochip manufacturing, and in particular relates to a nano-needle array and its preparation method and application. Background technique [0002] Diamond is a multifunctional material with unique properties, integrating extreme physical and chemical properties such as electricity, optics, mechanics, and heat. In addition to the inherent physical and chemical properties of diamond, one-dimensional nano-diamonds also have some properties that bulk diamonds do not have due to changes in their shape and size, such as hard and elastic mechanical properties, high specific surface area, and tip effect. Wait. Therefore, one-dimensional nanodiamond arrays have important applications in many fields such as drug delivery, chemical and biological sensors, high-performance electrodes, analytical sensors, and quantum information devices. [0003] The technology of using high aspect ratio nanomaterials to m...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00B81B1/00A61M37/00
CPCA61M37/0015A61M2037/0053A61M2037/0061B81B1/008B81C1/00031B81C1/00111B81C1/00531
Inventor 杨扬史鹏张文军
Owner 深圳市安瑞生物科技有限公司
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