Preparation method of graphene transparent conductive film with superfine conductive pattern

A technology of transparent conductive film and conductive pattern, applied in cable/conductor manufacturing, conductive layer on insulating carrier, circuit, etc., can solve the problems of high manufacturing cost, difficult to meet, low transmittance, etc., and achieve excellent performance performance effect

Inactive Publication Date: 2020-12-01
安徽宇航派蒙健康科技股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. The transparent conductive film prepared by CVD method has high manufacturing cost and many problems in doping stability, which make it impossible to apply on a large scale;
[0005] 2. The graphene transparent conductive film prepared by graphene ink has low transmittance and high square resistance, which also hinders the corresponding large-scale production and application
[0006

Method used

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  • Preparation method of graphene transparent conductive film with superfine conductive pattern
  • Preparation method of graphene transparent conductive film with superfine conductive pattern
  • Preparation method of graphene transparent conductive film with superfine conductive pattern

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Experimental program
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Effect test

Embodiment 1

[0043] There is the preparation method of the graphene transparent conductive film (without protective film) of superfine conductive pattern, see image 3 , the process flow A-E are respectively: A, preparation of glass substrate; B, preparation of parylene coating; C, preparation of polyimide film; D, preparation of graphene pattern on polyimide film for LIG process; E , Peel off ultra-thin, flexible graphene transparent conductive film. Specific steps are as follows:

[0044] 1) Prepare a flat panel display glass 301 with a glass thickness of 1 mm, and clean and dry it for use (step A).

[0045] 2) Deposit a layer of parylene film 401 with a thickness of 5 microns on the surface of the flat glass by chemical vapor deposition as a release film (step B).

[0046] 3) On the surface of the parylene film 401, a layer of polyimide (PI) transparent insulating film 203 is prepared by suspension coating polyimide prepolymer by suspension coating method, and then undergoes high-temp...

Embodiment 2

[0050] The preparation method of the graphene transparent conductive film (without protective film) of superfine conductive pattern:

[0051] 1) Prepare a flat panel display glass with a glass thickness of 1 mm, and clean and dry it for later use;

[0052] 2) Deposit a layer of parylene film with a thickness of 5 microns on the surface of the flat glass as a release film by chemical vapor deposition;

[0053] 3) On the surface of the parylene film, a layer of polyimide (PI) transparent insulating film was prepared by suspension coating method by suspension coating polyimide prepolymer, and then imidized at high temperature, with a film thickness of 5 Micron, imidization condition: 300°C, 60min;

[0054] 4) Using laser-induced (LIG) graphene processing technology with a short-wavelength laser light source, graphene is prepared on the surface of the transparent insulating film and a fine graphene pattern (honeycomb shape) is formed. The internal structure of the pattern is show...

Embodiment 3

[0057] The preparation method of the graphene transparent conductive film (with protective film) with ultra-fine conductive pattern:

[0058] 1) Prepare a flat panel display glass with a glass thickness of 1 mm, and clean and dry it for later use;

[0059] 2) Deposit a layer of parylene film with a thickness of 10 microns on the surface of the flat glass as a release film by chemical vapor deposition;

[0060] 3) On the surface of the parylene film, the polyimide prepolymer is coated by the slit coating method, and then a layer of polyimide (PI) transparent insulating film is prepared through high-temperature imidization, and the film thickness is 15 microns, the imidization conditions are: 300°C, 60min;

[0061] 4) Using laser-induced (LIG) graphene processing technology with a short-wavelength laser light source, graphene is prepared on the surface of the transparent insulating film and a fine graphene pattern (square shape) is formed. In a single graphene grid, the wires ...

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Abstract

The invention provides a preparation method of a graphene transparent conductive film with a superfine conductive pattern. The preparation method comprises the following steps of S1, preparing a planar glass substrate, S2, preparing a parylene (parylene) film on the surface of the planar glass substrate to serve as a release layer of the conductive film, S3, preparing a layer of polyimide (PI) film on the surface of the parylene film, S4, preparing graphene on the surface of the transparent insulating film and forming a graphene fine pattern by adopting a laser-induced graphene (LIG) technology of a short-wavelength laser light source, and S5, stripping the polyimide transparent insulating film from the surface of the planar glass to obtain the superfine flexible graphene transparent conductive film.

Description

technical field [0001] The invention relates to a preparation method of a graphene transparent conductive film. Background technique [0002] Transparent conductive films, analyzed from a technical point of view, have been developed for nearly a hundred years. From the perspective of industrialization, with the development of lighting and display technology, there is also a development history of nearly 60 years. It is a veritable functional material with a strategic role in the 20th and 21st centuries, and plays a pivotal role in many fields. [0003] Graphene is an emerging strategic material developed in the 21st century. In the development of graphene industry, graphene transparent conductive film is an industrial branch with important application value. The current graphene transparent conductive film, technically speaking, has two major technical paths: one is the graphene transparent conductive film prepared by chemical vapor deposition (CVD); the other is the graphe...

Claims

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Application Information

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IPC IPC(8): H01B5/14H01B1/04H01B13/00H01L27/32G06F3/041
CPCH01B5/14H01B1/04H01B13/00G06F3/0412H10K59/40
Inventor 谭化兵潘智军
Owner 安徽宇航派蒙健康科技股份有限公司
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