Preparation method of zinc oxide-based ceramic sputtering target material

Abstract

The invention belongs to the technical field of zinc oxide materials, and particularly relates to a preparation method of a zinc oxide-based sputtering target material, which is simple and wide in rawmaterial source, obtains a good target material preparation effect by preparing a material taking zinc oxide as a main body to assist in bonding zinc oxide nano-powder and does not need to dischargeglue in the process, and unnecessary defects can also be reduced. Therefore, the preparation method has the advantages of being simple in technological process, easy to operate and process and the like, the prepared zinc oxide ceramic target material has excellent thermal shock resistance, high density, high density and high strength, the crack phenomenon on the surface of the ceramic target material can be eliminated as much as possible, and pores are avoided during sintering. The preparation method is simple and more suitable for assembly line mass production.

Description

Technical field[0001]The invention belongs to the technical field of zinc oxide materials, in particular to a method for preparing a zinc oxide-based ceramic sputtering target material.Background technique[0002]Electron beam evaporation and its derived reactive plasma deposition require ceramic evaporation raw materials with good thermal shock resistance. The raw material for electron beam evaporation can be small particles or large blocks. If small particles are stacked together to evaporate, it will affect the scattering of gas during gasification and affect the uniformity of the film. Therefore, large bulk evaporation materials have been developed. High-quality target materials require high purity, uniformity, density, electrical conductivity, better strength and larger size. In order to improve the thermal shock resistance of the evaporation target, the density of the target can be reduced to release the thermal stress. For example, the low-density ITO evaporation target disclos...

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Problems solved by technology

However, by simply reducing the density of the evaporated material, although part of the thermal stress can be released and the possibility of cracking of ceramics when bombarded by high-energy electron beams can be reduced, the requirement of completely avoiding cracking cannot be met due to insufficient bonding strength. The preparation method of the zinc oxide evaporation target material generally adopts "glue". During the preparation process, the glue needs to be removed, and the glue is an important forming part. Without glue, it is difficult to form and the performance is even worse. Wait to control, but with little effect, for example CN104987060B discloses the preparation method of the zinc oxide vapor deposition target material with skeleton network structure, but the preparation process has used the bonding agent of polyvinyl alcohol, need deglue, be subjected to great restriction and constraints, still has the defects of poor applicability and complicated process. Chinese patent CN102924077A discloses a method for preparing large-size zinc oxide-based targets by using a new type of low-toxicity gel casting. The premix solution includes methacrylamide, N, N '- Dimethylenebisacrylamide, ammonium polyacrylate and water solidify under the action of the initiator to form a high-strength green body. In essence, the premixed solution is polymerized to form a polymer of polyacrylamide, and the problem of debinding is still not solved. In order to solve the above problems, it is still necessary to carry out high-temperature debinding in the form of multi-stage temperature curves to obtain the green body. To solve the above problems, it is urgent to develop a method for preparing zinc oxide-based ceramic sputtering targets to meet the existing market demand. and performance requirements

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