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Preparation method of cerium dioxide fluoride polishing powder under microwave condition

A technology of fluorinated cerium dioxide and polishing powder, which is applied in the preparation/treatment of rare earth metal compounds, chemical instruments and methods, rare earth metal oxyhalides, etc., and can solve the problems of increasing equipment, consuming time, and reducing product purity. , to achieve the effects of weakening agglomeration, reducing surface scratches, and simplifying the process flow

Active Publication Date: 2021-01-26
INNER MONGOLIA UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This approach often entails additional costs and steps, with the risk of time-consuming, additional equipment, and reduced product purity

Method used

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  • Preparation method of cerium dioxide fluoride polishing powder under microwave condition
  • Preparation method of cerium dioxide fluoride polishing powder under microwave condition
  • Preparation method of cerium dioxide fluoride polishing powder under microwave condition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Example 1 (no microwave control group)

[0038] A preparation method of fluorinated ceria polishing powder under a water bath condition, comprising the following steps:

[0039] (1) Take Ce (NO 3 ) 3 ·6H 2 O, NH 4 HCO 3 and NH 4 F was dissolved in deionized water, and 500 mL of 0.0582 mol / L cerium nitrate aqueous solution, 125 mL of 1.047 mol / L ammonium bicarbonate aqueous solution and 125 mL of 0.126 mol / L ammonium fluoride aqueous solution were prepared; The influence of polishing powder preparation does not study the influence of the above-mentioned component content on the polishing powder. The above-mentioned component dosage is a preferred solution in the research process of the present invention, and its selection range satisfies the following conditions:

[0040] A.NH 4The amount of F is 5% to 7% of the quality of the final product as the fluorine element;

[0041] B.NH 4 HCO 3 and Ce(NO 3 ) 3 ·6H 2 The molar ratio of O is more than 4.5:1;

[0042]...

Embodiment 2

[0054] A preparation method of fluorinated ceria polishing powder under microwave conditions, comprising the following steps:

[0055] (1) Take Ce (NO 3 ) 3 ·6H 2 O, NH 4 HCO 3 and NH 4 F was dissolved in deionized water, and 500 mL of 0.0582 mol / L cerium nitrate aqueous solution, 125 mL of 1.047 mol / L ammonium bicarbonate aqueous solution and 125 mL of 0.126 mol / L ammonium fluoride aqueous solution were prepared;

[0056] (2) get the cerium nitrate solution configured in the above (1) and put it into the microwave reactor for microwave heating, the heating temperature is to 65 ° C, and get the ammonium fluoride solution in the above (1) and add it, and stir magnetically evenly;

[0057] (3) get the ammonium bicarbonate solution configured in the above-mentioned (1), add the cerium nitrate and ammonium fluoride mixed solution obtained in the above-mentioned (2), stir magnetically and react 75min at a constant temperature of 65 ℃ in a microwave mode;

[0058] In steps (2)...

Embodiment 1、2

[0065] Embodiment 1,2 comparative analysis is as follows:

[0066] (1) as figure 1 Shown is the SEM image of the precursor cerium carbonate under the water bath condition prepared in Example 1, such as figure 2 Shown is the SEM image of the precursor cerium carbonate under microwave conditions prepared in Example 2; the comparison of the two SEM images shows that the cerium carbonate particles prepared under microwave conditions are more rounded and have better particle dispersibility.

[0067] (2) as image 3 Shown is the SEM image of fluorinated ceria under the water bath condition prepared in Example 1, such as Figure 4 Shown is the SEM image of fluorinated ceria under microwave conditions prepared in Example 2; by comparison, it can be seen that the ceria particles prepared under water bath conditions have large-scale agglomeration, while the ceria particles prepared under microwave conditions The dispersibility of cerium dioxide particles is good, indicating that mic...

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Abstract

The invention discloses a preparation method of cerium dioxide fluoride polishing powder under a microwave condition, which belongs to the technical field of nano rare earth material preparation. Thepreparation method comprises the following steps: dissolving Ce(NO3)3.6H2O in deionized water, preheating in a microwave mode, and adding NH4F; dissolving NH4HCO3 in deionized water, adding a preheated Ce(NO3)3.6H2O and NH4F mixed solution into the deionized water, carrying out a constant-temperature precipitation reaction under a microwave condition to generate a Ce2(CO3)3 precursor, and continuing to age the Ce2(CO3)3 precursor; filtering the precursor reaction solution to obtain a precipitate, drying at a constant temperature, and grinding into powder; and roasting the precursor powder to prepare cerium dioxide fluoride polishing powder. The cerium dioxide powder prepared by the method disclosed by the invention is high in particle crystallinity, regular and spherical in morphology, uniform in particle size distribution and good in dispersity, and the polishing efficiency and the polishing precision of the fluorinated cerium dioxide powder are further improved.

Description

technical field [0001] The invention belongs to the technical field of preparation of nano-rare earth materials, in particular to a preparation method of fluorinated ceria polishing powder under microwave conditions. Background technique [0002] The polishing principle of rare earth cerium oxide polishing powder is chemical mechanical polishing. While the surface is physically ground, chemical reactions are continuously carried out, which makes cerium oxide polishing powder have high polishing efficiency and excellent polishing quality that traditional polishing powder cannot match. In addition, cerium oxide polishing powder has moderate hardness, long service life, and little pollution to the polishing surface. Therefore, cerium oxide has become the best among many polishing materials in the polishing field of optical instrument glass, disk glass substrate, optical instrument glass and picture tube. select. With the advancement of science and technology, the surface rough...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02C09K3/14C01F17/10C01F17/259
CPCC01P2002/72C01P2004/03C01P2004/32C01P2004/61C09G1/02C09K3/1454C01F17/10C01F17/259
Inventor 贾慧灵徐阳吴锦绣李梅谭心杜鹏飞
Owner INNER MONGOLIA UNIV OF SCI & TECH
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