Space laser film preparation method

A laser thin film and space technology, which is applied in vacuum evaporation coating, coating, sputtering coating, etc., can solve the problems of poor stability of laser thin film, achieve reduced surface and subsurface defects, small spectral shift, high The effect of dimensional stability

Active Publication Date: 2021-01-26
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to provide a space laser thin film preparation method, and proposes a full-process technical solution including removing substrate surface pollutants and s

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Example Embodiment

[0033]Example 1: Using quartz glass as the substrate, Al2O3For the film material, SiO2Prepare a 1064nm antireflection film for the protective layer material.

[0034]The substrate is ultrasonically cleaned for 10-30 minutes, then rinsed with deionized water, and finally dried with high-purity nitrogen; the vacuum chamber in the coating machine is scrubbed, and vacuum is pumped; the substrate is placed in the coating machine, and the vacuum chamber door is closed , Perform vacuum pumping again to control the background vacuum of the vacuum chamber in the coating machine to 2×10-6Pa, heat the substrate to keep its temperature at 80℃; before coating, perform ion beam etching on the substrate, bombard the substrate with Ar ion source, use Ar ion source voltage of 650V, etching depth 200nm; use dual ion beam sputtering The equipment is coated on the above-treated substrate, the main ion source voltage is 1250V, argon is used as the main ion source gas, the auxiliary ion source voltage is 65...

Example Embodiment

[0037]Example 2: Using quartz glass as the substrate, Ta2O5For the film material, SiO2Prepare high-reflection film for protective layer material.

[0038]The substrate is ultrasonically cleaned for 10-30 minutes, then rinsed with deionized water, and finally dried with high-purity nitrogen; the vacuum chamber in the coating machine is scrubbed, and vacuum is pumped; the substrate is placed in the coating machine, and the vacuum chamber door is closed , Perform vacuum pumping again to control the background vacuum of the vacuum chamber in the coating machine to 2×10-6Pa, heat the substrate to keep its temperature at 80℃; before coating, perform ion beam etching on the substrate, bombard the substrate with Ar ion source, use Ar ion source voltage of 650V, etching depth 200nm; use dual ion beam sputtering equipment Coating on the above-treated substrate, the main ion source voltage is 1250V, argon is used as the main ion source gas, the auxiliary ion source voltage is 650V, the flow ratio...

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Abstract

The invention belongs to the technical field of optical films, and particularly relates to a space laser film preparation method. The method provides the whole process technical scheme for preparing aspace laser film. The method comprises the following steps that pollutants and sub-surface defects on the surface of a substrate are removed, an anti-radiation protective layer is added, the substrate is coated with the film. The technical scheme and implementation way of each link are defined, the defects on the surface and sub-surface of the substrate are greatly reduced by using the film prepared by the method, the refractive index of the film can reach the level of a bulk material, spectral offset is small in an atmospheric-vacuum environment, the film is not liable to be affected by space particle irradiation, the film has a high laser damage threshold value, and the situation that a conventional laser film is not suitable for the space environment is avoided.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and in particular relates to a method for preparing space laser thin films. Background technique [0002] With the continuous deepening of human exploration of the space environment and the continuous development of lasers, space laser systems have become an important tool in space missions. As one of the weakest components in the optical system, the optical film cannot be repaired or replaced once it is damaged during orbital operation, so its stability and service life are crucial to the entire system. In space, there are special environmental factors such as vacuum, high and low temperature alternation, and high-energy particle radiation that are different from the ground. For space applications, laser thin films must not only resist laser damage, but also have good stability in the space environment. , which puts forward higher requirements for optical films. [0003] However, th...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/02C23C14/54C23C14/08C23C14/10
CPCC23C14/3442C23C14/022C23C14/54C23C14/081C23C14/10C23C14/083C23C14/0036
Inventor 王胭脂王志皓张宇晖陈瑞溢许贝贝朱晔新赵娇玲邵宇川易葵贺洪波邵建达
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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