Treatment method of industrial wastewater with high organic matter content and high arsenic content

A treatment method and technology for industrial wastewater, applied in water/sewage treatment, adsorption water/sewage treatment, neutralized water/sewage treatment, etc., can solve the problems of limiting organic matter removal efficiency, unfavorable microbial growth, and inability to use biochemical methods

Pending Publication Date: 2021-02-02
紫石能源有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, a large amount of complex organic matter in wastewater from the photovoltaic semiconductor industry will react with iron ions to produce iron complexes, which prevent the formation of Fe(OH) 3 or Fe(OH) 2 The formation of iron and arsenic will affect the reaction of iron and arsenic to produce iron arsenate precipitation; and the existence of a large amount of organic matter will also inhibit the oxidation of trivalen

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  • Treatment method of industrial wastewater with high organic matter content and high arsenic content
  • Treatment method of industrial wastewater with high organic matter content and high arsenic content
  • Treatment method of industrial wastewater with high organic matter content and high arsenic content

Examples

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Embodiment 1

[0061] This embodiment provides a treatment method for photovoltaic semiconductor industrial wastewater with high organic matter and high arsenic content, specifically as follows:

[0062] (1) pH adjustment: import 5L of industrial wastewater into the oxidation treatment organic matter reaction tank, add hydrochloric acid to adjust the pH of the industrial wastewater to 4;

[0063] (2) Oxidation treatment to remove organic matter: add ferrous sulfate to its final concentration of 1.6mol / L, stir for 7min, add hydrogen peroxide to its final concentration of 4mol / L, stir for 30min, and oxidize the precipitation of wastewater after treatment and supernatant separation;

[0064] (3) First-level precipitation to remove arsenic: the waste water supernatant obtained in step (2) is introduced into the first-level arsenic removal coagulation sedimentation tank, and the gas-water volume ratio is 3:1. Ferric chloride until its final concentration in the wastewater treatment system is 1mo...

Embodiment 2

[0069] This embodiment provides a treatment method for photovoltaic semiconductor industrial wastewater with high organic matter and high arsenic content. The difference from Example 1 is that the resin columns used in step (5) are different: the resin columns used include iron carbon from bottom to top. Catalyst particle layer, iron sand filter material, sea sand filter material, special arsenic removal resin layer; the thickness of iron-carbon catalyst particle layer, iron sand filter material, sea sand filter material, and special arsenic removal resin layer is 150mm, 150mm, 250mm, 800mm .

Embodiment 3

[0071] This embodiment provides a treatment method for photovoltaic semiconductor industrial wastewater with high organic matter and high arsenic content. The difference from Example 1 is that in step (3) "add ferric chloride until its final concentration in the wastewater treatment system is 1mol / L" is replaced with "Add ferric sulfate until its final concentration in the wastewater treatment system is 4.8mol / L".

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Abstract

The invention relates to the technical field of industrial wastewater treatment, in particular to a treatment method of industrial wastewater with high organic matter content and high arsenic content.The COD in the photovoltaic semiconductor industrial wastewater is greater than or equal to 1000mg/L, and the arsenic content is greater than or equal to 100mg/L. The wastewater treatment method provided by the invention comprises the following steps: sequentially carrying out oxidation treatment on industrial wastewater to remove organic matters, carrying out primary precipitation arsenic removal, carrying out secondary precipitation arsenic removal and carrying out resin column treatment, wherein a resin column adopted for resin column treatment sequentially comprises an iron-carbon catalyst particle layer, an iron sand filter material, a sea sand filter material and a special arsenic removal resin layer from bottom to top. According to the method, the two-stage precipitation arsenic removal is matched with the cooperative treatment effect of the matched resin column designed according to the characteristics of the wastewater, and all the steps can be better coupled and matched so that the arsenic content in the treated wastewater is less than or equal to 0.01 ppm, and the COD is less than or equal to 60mg/L.

Description

technical field [0001] The invention relates to the technical field of industrial wastewater treatment, in particular to a treatment method for industrial wastewater with high organic matter and high arsenic content generated in a photovoltaic semiconductor production process. Background technique [0002] Gallium arsenide is an important raw material necessary for the preparation of solar cells, so it is widely used in the photovoltaic semiconductor industry, which leads to a large amount of arsenic-containing wastewater in the wastewater generated by the photovoltaic semiconductor industry. Arsenic and its compounds are highly toxic carcinogens, and if they enter the human body, they are easily enriched and poisoned to death. At present, the commonly used arsenic-containing wastewater treatment methods mainly include: chemical precipitation method, adsorption method, ion exchange method, membrane separation and microbial method, etc. The arsenic content in general wastewat...

Claims

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Application Information

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IPC IPC(8): C02F9/04C02F101/10C02F101/30
CPCC02F9/00C02F2101/30C02F2101/103C02F1/56C02F1/5236C02F2001/007C02F1/66C02F1/28C02F1/285C02F1/72C02F1/74C02F1/727C02F1/78C02F1/722C02F1/725
Inventor 周婕
Owner 紫石能源有限公司
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