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Method for preparing two-dimensional transition metal chalcogenide in-plane heterojunction

A transition metal chalcogenide and compound technology, applied in chemical instruments and methods, metal material coating process, gaseous chemical plating, etc., can solve problems such as interface pollution

Inactive Publication Date: 2021-05-07
BEIJING JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The traditional one-step method to prepare in-plane heterojunctions is easy to contaminate the two components to form an alloy, while the two-step method inherently causes contamination at the interface. Therefore, it is necessary to study a process-controllable one-time continuous growth in-plane A heterojunction approach is necessary, and this application arose from it

Method used

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  • Method for preparing two-dimensional transition metal chalcogenide in-plane heterojunction
  • Method for preparing two-dimensional transition metal chalcogenide in-plane heterojunction
  • Method for preparing two-dimensional transition metal chalcogenide in-plane heterojunction

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Embodiment Construction

[0037] Below in conjunction with accompanying drawing and example the present invention is described in further detail:

[0038] Step 1: Weigh 0.5gS powder, 10mgWO 3 Solid powder and 6mgMoO 3 solid powder, WO 3 Mix solid powder with NaCl solid powder at a ratio of 5:1, MoO 3 The solid powder is mixed with the NaCl solid powder at a ratio of 6:1, and then put into three quartz boats respectively;

[0039] Step 2: Sequentially test the cut Si / SiO in the environment of detergent, deionized water and absolute ethanol 2 The substrate was ultrasonically cleaned, and then the surface of the substrate was flushed with nitrogen, and then the substrate was cleaned in a plasma oxygen ion cleaner for 5 minutes. Treated Si / SiO 2 The substrate is placed upside down on the quartz rack, which is located directly above the heating center. There is a small square hole of 1cm x 1cm in the middle of the quartz rack to ensure that the substrate inverted on the quartz rack is close enough to t...

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Abstract

The invention provides a method for preparing a two-dimensional transition metal chalcogenide in-plane heterojunction. The method has the characteristic that a precursor can move in a reaction process so as to realize continuous growth of the in-plane heterojunction, and the implementation method comprises the following steps: mixing a cation oxide precursor with NaCl solid powder to form cation solid powder; putting the cation solid powder and anion precursor powder into a single-temperature-zone tubular furnace, controlling the single-temperature-zone tubular furnace to stay at evaporation temperatures corresponding to different solid powder mixtures for a certain growth time, and meanwhile, matching with a precursor to correspondingly enter or leave a growth region near a substrate, so as to finally obtain the two-dimensional transition metal chalcogenide in-plane heterojunction. Compared with a traditional one-step method and a two-step method, the in-plane heterojunction prepared through the method has the advantages that the film forming area is increased, the film forming quality is improved, the pollution rate of the junction area position is reduced, the experimental conditions and cost provided by the method are greatly reduced, and a direction is provided for industrial production of the type of materials.

Description

technical field [0001] The invention belongs to the technical field of heterojunction preparation, and in particular relates to a method for preparing a two-dimensional transition metal chalcogenide in-plane heterojunction. Background technique [0002] Compared with bulk materials, two-dimensional materials have unique advantages. Their atomically thick structures have good immunity to short channel effects, and their excellent mechanical strength makes them have the potential to be applied to flexible and wearable electronic devices. However, a single two-dimensional material cannot actually meet the needs of the development of multifunctional devices. Therefore, the idea of ​​assembling different two-dimensional materials into heterostructures emerged as the times require. [0003] Two-dimensional material heterojunctions provide many physical properties that single two-dimensional materials do not have. At present, the main research work is in the direction of van der W...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/46C23C14/06C23C16/54C30B25/00
CPCC23C14/0623C23C16/54C30B25/00C30B29/46
Inventor 何大伟白晋轩王永生
Owner BEIJING JIAOTONG UNIV
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