Preparation method of self-supporting nanocone diamond
A diamond and nano-cone technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problems of high hardness and chemical inertness, inconvenience, and changing diamond morphology.
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Embodiment 1
[0019] Embodiment 1: the preparation of nanocone diamond film on silicon wafer substrate
[0020] A silicon wafer with a size of 1cm×1cm is selected as the growth substrate, and the silicon wafer is first cleaned to remove surface pollutants. In order to increase the nucleation density during the growth process, the growth surface was ground on sandpaper containing diamond powder for 15 to 30 minutes, and placed in alcohol containing diamond powder for ultrasonic treatment for 1 hour, and finally passed through acetone, alcohol, and deionized water. Sequentially ultrasonically cleaned for 10 min, dried with nitrogen, and placed in a CVD reaction chamber to deposit a diamond film. The main growth parameters are: the gas flow rates of hydrogen, methane, and nitrogen are 200sccm, 10sccm, and 1sccm respectively, the microwave power is 350W, the chamber pressure is 8KPa, and the growth time is 5 hours. A mixed phase of diamond and non-diamond is obtained, and the film deposition th...
Embodiment 2
[0025] Embodiment 2: the preparation of molybdenum substrate nano cone diamond film
[0026] A molybdenum sheet with a size of 1cm×1cm was selected as the growth substrate, and the molybdenum sheet was first cleaned to remove surface pollutants. In order to increase the nucleation density during the growth process, the growth surface was ground on sandpaper containing diamond powder for 15-30 minutes, and then ultrasonically treated in alcohol containing diamond powder for 2 hours, and finally ultrasonicated in acetone, alcohol, and deionized water. After cleaning and drying with nitrogen gas, put it into the CVD reaction chamber to deposit diamond film. The main growth parameters are: the gas flow rates of hydrogen, methane, and nitrogen are 200sccm, 16sccm, and 1sccm respectively, the microwave power is 350W, the cavity pressure is 8KPa, and the time is 5 hours. The mixed phase of diamond and non-diamond is grown, and the film deposition thickness is about 20μm. Turn off th...
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