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Method and device for treating nitric oxide in tail gas generated by plasma cracking of organic fluorine

A plasma cracking and nitrogen oxide technology, applied in the field of ion cracking of nitrogen oxides in organic fluorine tail gas, can solve the problems that have not yet been seen, and achieve the effects of ensuring long-term recycling, convenient operation and high operating flexibility

Inactive Publication Date: 2021-05-21
ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] So far, there has been no relevant report on the method of using urea solution reaction to eliminate nitrogen oxides in the tail gas of plasma cracking organic fluorine

Method used

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  • Method and device for treating nitric oxide in tail gas generated by plasma cracking of organic fluorine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] Example 1

[0062] The flue gas produced by cracking first enters the primary quenching and water washing tower through the fan for spray absorption;

[0063] (3) The remaining tail gas is introduced into the secondary reaction absorption tower, and the reaction absorption operation is carried out. The unabsorbed tail gas finally enters the alkali washing absorption neutralization system, and further neutralization operation is carried out. The purified non-condensable gas and inert gas finally pass through the chimney exhaust into the atmosphere;

[0064] (4) Detection of absorption effect: Visually check whether there is yellow smoke coming out of the chimney discharge port, and take samples to analyze the nitrogen oxide content of the exhaust tail gas.

[0065] Example 1

[0066] Add urea solution to the reactor of the reaction absorption tower, check and confirm that the liquid level of the tower reactor of the absorption tower is 1 / 2 to 2 / 3, and analyze the conce...

Embodiment 2

[0069] Add urea solution to the reaction absorption tower kettle, check and confirm that the liquid level of the absorption tower tower kettle is 1 / 2~2 / 3, and the concentration of the analysis solution is 30%. Start the circulation pump of the reaction absorption tower and adjust the circulation spray flow rate of the absorption liquid to 15m 3 / h, adjust the air valve of the fan to ensure that the pressure of the absorption tower is -100 ~ -150Pa; start the plasma cracking device, the plasma furnace implements the operation of cracking the organic fluorine residue, and the flue gas generated first enters the first-stage quenching and water washing tower through the fan. Spray absorption, the remaining tail gas is introduced into the secondary reaction absorption tower, and the reaction absorption operation is carried out. The unabsorbed tail gas finally enters the alkali washing absorption neutralization system, and further neutralization operation is carried out. The purified...

Embodiment 3

[0072] Add urea solution to the tower kettle of the reaction absorption tower, check and confirm that the liquid level of the tower kettle of the absorption tower is 1 / 2 to 2 / 3, and the concentration of the analyzed solution is 30%. Start the circulation pump of the reaction absorption tower and adjust the circulation spray flow rate of the absorption liquid to 20m 3 / h, adjust the air valve of the fan to ensure that the pressure of the absorption tower is -150~-200Pa; start the plasma cracking device, and the plasma furnace implements the operation of cracking the organic fluorine residual liquid, and the flue gas generated first enters the primary quenching and water washing tower through the fan for further processing Spray absorption, the remaining tail gas is introduced into the secondary reaction absorption tower, and the reaction absorption operation is carried out. The unabsorbed tail gas finally enters the alkali washing absorption neutralization system, and further ne...

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Abstract

The invention discloses a method and a device for treating nitrogen oxides in plasma cracking organic fluorine tail gas, and the method comprises the following steps: the plasma cracking organic fluorine tail gas is physically absorbed and then is introduced from the lower part of an absorption tower, and composite absorption of the tail gas is realized through negative pressure countercurrent circulation spraying of a urea solution entering from the upper part of the absorption tower; and finally, the tail gas subjected to compound absorption is discharged after being neutralized and absorbed. The device comprises a first-stage absorption tower, a second-stage absorption tower and a third-stage absorption tower which are sequentially connected, the tail gas of plasma cracking organic fluorine is connected with a gas inlet of the first-stage absorption tower through a pipeline, and a gas inlet and a gas outlet of the second-stage absorption tower are connected with a gas outlet of the first-stage absorption tower and a gas inlet of the third-stage absorption tower respectively. A gas outlet of the third-stage absorption tower is communicated with the atmosphere. The method is mild in reaction condition and high in absorption efficiency; energy is saved, environment is protected, no side reaction is generated, and no secondary pollution is generated; the method is simple in process, high in adaptability, convenient to operate, high in operation flexibility and low in treatment cost.

Description

technical field [0001] The invention relates to the technical field of chemical industry, in particular to a method and a device for treating nitrogen oxides in tail gas of plasma cracking organic fluorine. Background technique [0002] Plasma cracking harmless treatment of organic fluorine residue and organic fluorine waste gas engineering technology is a mature, advanced and environmentally friendly clean production technology; compared with traditional fuel incineration and cement kiln burning, plasma cracking harmless treatment has temperature High, complete cracking, organic matter can be completely decomposed within 15 milliseconds at 1500 ° C, no secondary pollution, safe and reliable operation, and efficient operation and treatment, etc., have become persistent high-risk wastes (POPs) such as polychlorinated biphenyls (PCBs), organic fluorine residue, organic fluorine waste gas, medical waste, highly toxic chemicals, etc. [0003] Plasma cracking treatment of organi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/56B01D53/78B01D53/96
CPCB01D53/56B01D53/78B01D53/96B01D2251/2067
Inventor 刘守贵荣虎何光梅邓礼洪聂成彬张晓春
Owner ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD