Magnetic field auxiliary cathode arc striking device and film coating method

Abstract

The invention relates to a magnetic field auxiliary cathode arc striking device and a film coating method. The device comprises an arc striking electrode, a plurality of arc striking needles, a cathode target, a focusing coil and a deflection coil, wherein the arc striking electrode comprises an annular inner side surface; the arc striking needles are arranged on the annular inner side surface of the arc striking electrode; the cathode target comprises a circular truncated cone section, the cathode target is arranged on the inner side of the arc striking electrode, the cathode target and the arc striking electrode are arranged at intervals, the circular truncated cone section comprises a first end surface and a second end surface, and the area of the first end surface is larger than that of the second end surface; the ends of the arc striking needles are in contact with the cathode target; the focusing coil is arranged on the periphery of the arc striking electrode, and the axial direction of the focusing coil is parallel to or coaxial with the axial direction of the circular truncated cone section; and the deflection coil is used for regulating and controlling an arc ion deflection path. According to the device or the method, the arc spot movement track can be controlled, and formation of large particles is reduced.

Description

technical field [0001] The invention relates to an arc striking device, in particular to a magnetic field assisted cathode arc striking device and a coating method. Background technique [0002] With the continuous improvement of the level of science and technology, the requirements for the surface properties of materials are getting higher and higher, and the surface modification technology of materials has also received more and more attention. [0003] As one of the physical vapor deposition technologies, cathodic arc ion plating technology is a vacuum coating technology developed by combining vacuum evaporation technology and sputtering technology. The technology was jointly developed by American Multi-arc Company and Vac-Tec Company, and entered the industrial application stage in 1981. In the decades that followed, the technology continued to advance by leaps and bounds in research. [0004] Cathodic arc ion plating technology is based on the principle of arc dischar...

AI Technical Summary

Problems solved by technology

[0007] There are still deficiencies in the existing arc ion plating improvement technology. After adding the magnetic filter device, although the pollution of large particles is controlled, the filtration of the plasma will lead to a decrease in the plasma density, especially the closed elbow filter structure, resulting in The film deposition rate is greatly reduced, and the coating uniformity of large-sized workpieces is poor, which affects production efficiency

At the same time, the closed magnetic filter chamber installed further increases the complexity of the equipment, expands the volume of the equipment, and increases the manufacturing cost of the equipment. Maintenance, which increases the difficulty of equipment maintenance

Images