Infrared optical product composite anti-reflection film and preparation method thereof
A technology of infrared optics and anti-reflection coating, applied in optics, optical components, gaseous chemical plating, etc., can solve problems such as cross contamination, process complexity, and the inability to use large-sized optical materials to coat, and achieve high adhesion , Excellent refractive index, uniform and dense product
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Embodiment 1
[0045] The preparation method of the infrared optical product composite anti-reflection film of the present invention comprises the following steps:
[0046] (1) The base material is ultrasonically treated in a water bath for 20 min with acetone and alcohol; the base material is zinc selenide;
[0047] (2) Place the substrate processed in step (1) on the sample stage of the ECR-MPCVD equipment, and the vacuum degree is 5×10 -4 Microwave preheating at Pa for 10 minutes, feed 15sccmAr and adjust the microwave power to 300W and the magnetic field coil current to 102A, so that the magnetic field strength of the substrate is 0.0875T, and the cavity pressure is adjusted to 0.3Pa. After the glow is generated, stop the Ar Transport and pass through 10sccmH 2 Perform plasma etching on the substrate for 10 minutes;
[0048] (3) the base material after the step (2) process is passed into process gas with ECR-MPCVD method to carry out GeC / DLC composite film pre-coating film; Described p...
Embodiment 2
[0055] The preparation method of the infrared optical product composite anti-reflection film of the present invention comprises the following steps:
[0056] (1) The base material is ultrasonically treated in a water bath for 20 min with acetone and alcohol; the base material is zinc sulfide;
[0057] (2) Place the substrate processed in step (1) on the sample stage of the ECR-MPCVD equipment, and the vacuum degree is 5×10 -4 Microwave preheating at Pa for 10 minutes, feed 15sccmAr and adjust the microwave power to 300W and the magnetic field coil current to 102A, so that the magnetic field strength of the substrate is 0.0875T, and the cavity pressure is adjusted to 0.3Pa. After the glow is generated, stop the Ar Transport and pass through 10sccmH 2 Perform plasma etching on the substrate for 10 minutes;
[0058] (3) the base material after the step (2) process is passed into process gas with ECR-MPCVD method to carry out GeC / DLC composite film pre-coating film; Described pr...
Embodiment 3
[0065] The preparation method of the infrared optical product composite anti-reflection film of the present invention comprises the following steps:
[0066] (1) The base material is ultrasonically treated in a water bath for 20 min with acetone and alcohol; the base material is zinc selenide;
[0067] (2) Place the substrate processed in step (1) on the sample stage of the ECR-MPCVD equipment, and the vacuum degree is 5×10 -4 Microwave preheating at Pa for 10 minutes, feed 15sccmAr and adjust the microwave power to 300W and the magnetic field coil current to 102A, so that the magnetic field strength of the substrate is 0.0875T, and the cavity pressure is adjusted to 0.3Pa. After the glow is generated, stop the Ar Transport and pass through 10sccmH 2 Perform plasma etching on the substrate for 10 minutes;
[0068] (3) the base material after the step (2) process is passed into process gas with ECR-MPCVD method to carry out GeC / DLC composite film pre-coating film; Described p...
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