Controllable growth method of electron beam induced carbon-based nanostructure based on needle tip enhancement

Abstract

The invention discloses a controllable growth method of an electron beam induced carbon-based nanostructure based on needle tip enhancement, and relates to the field of nanostructure controlled growth. The method comprises the following steps: a nano needle tip as a substrate is loaded on a transmission electron microscope sample rod; the surface of the nano needle tip is radiated by converging an electron beam light spot, and the amorphous carbon three-dimensional nanostructure on the surface of the nano needle tip is induced to grow; and the electron beam light spot is moved according to a model pattern for direct writing, the amorphous carbon three-dimensional nanostructure on the surface of the nano needle tip grows along with movement of the electron beam light spot, and controllable growth of the amorphous carbon three-dimensional nanostructure on the surface of the nano needle tip is achieved. According to the method, the electron beam induced amorphous carbon deposition phenomenon is utilized, the nano needle tip serves as the substrate, the local electric field intensity is effectively enhanced, the speed of reducing organic molecules into amorphous carbon through electron beam induction is increased, and accurate and controllable rapid growth of the amorphous carbon three-dimensional nanostructure is achieved; and meanwhile, the growth direction of the amorphous carbon on the surface of the nano needle tip substrate can be accurately controlled by controlling the irradiation position of the electron beam.

Description

technical field [0001] The invention relates to the technical field of controlled growth of nanostructures, in particular to a method for controlled growth of carbon-based nanostructures induced by electron beams enhanced by needle tips. Background technique [0002] The high-precision preparation technology of nanostructures is an important prerequisite for the development of nanotechnology frontiers such as nanodevices and nanomachines. At present, the commonly used methods mainly include wet chemical nanocrystal growth method, high vacuum vapor deposition methods such as MBE and MOCVD, and etching methods such as femtosecond laser and extreme ultraviolet light. Although these methods have their own advantages and disadvantages in terms of processing / growth precision, cost, and efficiency, these methods generally lack the ability to prepare 3D nanostructures under arbitrary model patterns. The growth space of nanostructures is often limited by thin-film substrates, so the...

AI Technical Summary

Problems solved by technology

The growth of nanostructures based on electron beam-induced deposition has outstanding advantages in terms of the control precision and degree of freedom of nanostructure growth, but its slow growth rate greatly limits the application potential of this method.

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