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An electrode structure resistant to arc ablation and its preparation method

A technology for generating electrodes and arcs, applied to electrical components, plasma, etc., can solve problems such as hindering characteristics

Active Publication Date: 2022-06-28
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, a small amount of oxides such as Th, Ce, Ba, etc. are added to the refractory metal tungsten to form a cathode material, such as the patent document Japanese Patent Laying-Open No. 5-54854, and the tungsten alloy added with these oxides is For the cathode, when the discharge is performed, the oxide diffuses from the inside of the alloy to the surface of the cathode to make up for the consumption of the discharge surface. Although it has the effect of reducing the work function, the diffusion process of the oxide becomes a rate-limiting step and hinders the improvement of the characteristics.

Method used

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  • An electrode structure resistant to arc ablation and its preparation method
  • An electrode structure resistant to arc ablation and its preparation method
  • An electrode structure resistant to arc ablation and its preparation method

Examples

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Embodiment 1

[0040] In this example, an electrode with a layered structure is prepared, in which the metal hafnium is the base layer, the metal hafnium and the hafnium oxide are the dual-phase layer, and the hafnium oxide is the surface layer. The stable arc current in the actual arc of the electrode is 50 A; according to the application environment of the electrode, the bearing arc root area is a circular area with a diameter of 5 mm.

[0041] The preparation process of this electrode is as follows:

[0042] 1. The surface of pure metal block hafnium is milled flat, soaked in acetone to remove oil stains, and then clamped to the arc generating device as a cathode;

[0043] 2. Start the active gas source outside the arc generating device to make the arc space full of active oxidizing atmosphere;

[0044] 3. According to the actual arc steady current of the electrode is 50 A, set the gradient current increasing program (such as figure 2 ); input the upper current limit of 50 A in the arc...

Embodiment 2

[0071] In this embodiment, metal zirconium is used as a matrix, zirconium and zirconium oxide are used as a dual-phase layer, and zirconium oxide is used as a surface layer to form an electrode with a layered structure. The stable arc current of the electrode is 30 A; according to the application environment of the electrode, the bearing arc root area is a circular area with a diameter of 3 mm.

[0072] The preparation process of this electrode is as follows:

[0073] 1. The surface of the pure metal block zirconium is milled flat and soaked in acetone to remove oil stains, and then clamped to the arc generating device as a cathode;

[0074] 2. Start the active gas source outside the arc generating device to make the arc space full of active oxidizing atmosphere;

[0075] 3. According to the application environment of the prepared electrode, the bearing arc root area is a circular area with a diameter of 3 mm. Therefore, the preparation range of the electrode is set as a cir...

Embodiment 3

[0080] The layered electrode of this embodiment includes a surface layer of yttrium oxide, a dual-phase layer of yttrium oxide and yttrium, and a metal yttrium matrix. The stable arc current of the electrode in service environment is 75 A, and the diameter of the bearing arc root is about 6 mm.

[0081] The preparation process of this electrode is as follows:

[0082] 1. Mill the surface of the pure metal block yttrium, remove the oil stain, and clamp it in the sample holder as the cathode;

[0083] 2. Start the active gas source of the arc generating device to make the arc space full of active oxidizing atmosphere;

[0084] 3. According to the electrode application environment, the preparation range is set as a circular area with a diameter of 6.5 mm, and the arc root is planned to move around the center to form a circular area with a diameter of 6.5 mm. The schematic diagram of the trajectory is similar to that of Example 1 ( figure 1 ).

[0085] According to the stable a...

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Abstract

The invention discloses an electrode structure with arc ablation resistance. The electrode structure includes at least a surface layer, a dual-phase layer and a matrix layer from the surface to the inside, wherein the matrix layer is metal; the surface layer is metal oxide. The dual-phase layer is an interlayer between the surface layer and the base layer, and the dual-phase layer is formed by the aggregation of the metal and the metal oxide. The metal oxide is formed by in situ oxidation of the metal of the base layer. Wherein the metal and its metal oxide satisfy that the metal oxide has a lower electron work function and a higher melting point than the metal. And the metal oxide is formed by in-situ oxidation of metal in the base layer through arc discharge. The electrode has uniform arc ablation characteristics, and the uniform ablation behavior of the electrode has good sustainability in the long-time arc discharge process. The invention also discloses the preparation method of the electrode and its application in arc discharge.

Description

technical field [0001] The invention relates to an electrode of an arc discharge device, in particular to a cathode of an arc discharge device with a layered structure and a preparation method of the cathode. Background technique [0002] The cathode is the most important part in the plasma generator, and its material is a high melting point metal. In the prior art, metal tungsten with a high melting point is mostly used. Ablation is the main process of unavoidable cathode failure in arc plasma applications such as vacuum contact switching, arc welding and plasma cutting. During arcing, the direction of the electric field in the arc plasma is from the anode end to the cathode end. The cations formed by the ionization of neutral molecules in the arc column are accelerated by the electric field and bombard the cathode surface. Due to the emission of electrons and bombardment by ions, the temperature of the cathode spot is extremely high, usually exceeding The melting point of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/24
CPCH05H1/24
Inventor 刘嘉斌关慰勉王宏涛方攸同
Owner ZHEJIANG UNIV