Ultraviolet light-emitting diode with p-i-n type multi-quantum well structure
A multi-quantum well structure, p-i-n technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problem of affecting the quantum efficiency or luminous efficiency of UV-LED devices, the reduction of electron and hole radiation recombination probability, and the suppression of UV-LED Light output capability and other issues
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[0018] The present invention will be further explained below in conjunction with the accompanying drawings.
[0019] Such as figure 1 As shown, a UV-LED with a p-i-n type multi-quantum well structure of the present invention, a substrate 101, an AlN buffer layer 102, an n-type AlGaN layer 103, and a p-i-n type multi-quantum well active region 104 are sequentially arranged from bottom to top , an electron blocking layer 105, a p-type AlGaN layer 106, a p-type GaN ohmic contact layer 107, and an n-type electrode 108 arranged on the n-type AlGaN layer 103 and a p-type electrode 109 arranged on the p-type GaN ohmic contact layer 106 .
[0020] The quantum barriers in the p-i-n type multi-quantum well active region 104 are, from bottom to top, n-type doped quantum barriers with different doping concentrations, undoped i-type quantum barriers, and p-type doped quantum barriers with different doping concentrations. Quantum barriers, that is, from bottom to top quantum barriers are...
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