Ultraviolet light-emitting diode with p-i-n type multi-quantum well structure

A multi-quantum well structure, p-i-n technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problem of affecting the quantum efficiency or luminous efficiency of UV-LED devices, the reduction of electron and hole radiation recombination probability, and the suppression of UV-LED Light output capability and other issues

Active Publication Date: 2021-08-13
SOUTHEAST UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The polarized electric field will cause the conduction band and valence band edge of the quantum well in the UV-LED to be tilted, so that the wave functions of electrons and holes are separated in space, resulting in a reduction in the probability of radiative recombination of electrons and holes, seriously Affect the internal quantum efficie

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  • Ultraviolet light-emitting diode with p-i-n type multi-quantum well structure
  • Ultraviolet light-emitting diode with p-i-n type multi-quantum well structure
  • Ultraviolet light-emitting diode with p-i-n type multi-quantum well structure

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Embodiment Construction

[0018] The present invention will be further explained below in conjunction with the accompanying drawings.

[0019] Such as figure 1 As shown, a UV-LED with a p-i-n type multi-quantum well structure of the present invention, a substrate 101, an AlN buffer layer 102, an n-type AlGaN layer 103, and a p-i-n type multi-quantum well active region 104 are sequentially arranged from bottom to top , an electron blocking layer 105, a p-type AlGaN layer 106, a p-type GaN ohmic contact layer 107, and an n-type electrode 108 arranged on the n-type AlGaN layer 103 and a p-type electrode 109 arranged on the p-type GaN ohmic contact layer 106 .

[0020] The quantum barriers in the p-i-n type multi-quantum well active region 104 are, from bottom to top, n-type doped quantum barriers with different doping concentrations, undoped i-type quantum barriers, and p-type doped quantum barriers with different doping concentrations. Quantum barriers, that is, from bottom to top quantum barriers are...

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Abstract

The invention discloses an ultraviolet light-emitting diode with a p-i-n type multi-quantum well structure. The ultraviolet light-emitting diode is provided with a substrate, an AlN buffer layer, an n-type AlGaN layer, a p-i-n type multi-quantum well active region, an electron blocking layer, a p-type AlGaN layer, a p-type GaN ohmic contact layer, an n-type electrode which is arranged on the n-type AlGaN layer and a p-type electrode which is arranged on the p-type GaN ohmic contact layer distributed from bottom to top in sequence. According to the ultraviolet light-emitting diode with the p-i-n type multi-quantum well structure, the carrier concentration and injection efficiency can be improved; an electric field opposite to an original built-in electric field in direction can be formed by utilizing the concentration difference of carriers in adjacent regions with different doping concentrations, and the original built-in electric field between a p type region and an n type region can be weakened, and the quantum limited stark effect caused by the built-in polarized electric field is reduced,so that the radiation recombination efficiency of electrons and holes is improved, and the light emitting power of the ultraviolet light-emitting diode is enhanced.

Description

technical field [0001] The invention relates to the manufacturing field of semiconductor optoelectronic materials and devices, in particular to an ultraviolet light emitting diode with a p-i-n type multi-quantum well structure. Background technique [0002] AlGaN-based ultraviolet light-emitting diodes (UV-LEDs) have the advantages of low energy consumption, environmental friendliness, and adjustable emission wavelengths, and can be widely used in printing ink curing, high-density data information storage, sterilization, healthcare, water and air purification and other fields. Due to the lack of GaN or AlN homogeneous substrates, AlGaN-based UV-LEDs usually use heterogeneous substrates, such as sapphire, silicon carbide, silicon and other substrates for growth. However, due to the large lattice mismatch between the heterogeneous substrate and the polar c-plane sapphire and other heterogeneous substrates, there are strong spontaneous polarization and piezoelectric The polar...

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Application Information

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IPC IPC(8): H01L33/00H01L33/06H01L33/32
CPCH01L33/0012H01L33/06H01L33/32
Inventor 张雄房瑞庭胡国华崔一平
Owner SOUTHEAST UNIV
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