Efficient preparation device for graphene insulating material film and using method thereof

A technology of insulating material film and preparation device, which is applied in the direction of spraying device, liquid spraying device, chemical instrument and method, etc. It can solve the problem that graphene solution is difficult to mix uniformly, affect the effect of graphene insulating material film, and affect the effect of graphene insulating material film. Preparation efficiency and other issues

Pending Publication Date: 2021-09-10
昆山三樱电子科技有限公司
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  • Application Information

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Problems solved by technology

[0004] In this embodiment, a high-efficiency preparation device for a graphene insulating material film and its use method are provided to solve the problem in the prior art that the graphene solution is difficult to mix evenl

Method used

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  • Efficient preparation device for graphene insulating material film and using method thereof
  • Efficient preparation device for graphene insulating material film and using method thereof
  • Efficient preparation device for graphene insulating material film and using method thereof

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Embodiment 3

[0047] The graphene heat dissipation film comprises: a heat dissipation layer containing graphene and a release paper layer compounded on the heat dissipation layer containing graphene. In the present invention, the heat dissipation layer containing graphene is used as the main structure, and the release paper layer is used as the supporting layer structure. The effect of the heat dissipation layer containing graphene is to dissipate heat, preferably a heat dissipation layer containing % graphene, and also preferably contain one or more of graphite, carbon fiber, carbon black and carbon nanotubes and a heat dissipation layer of graphene . The use of the new type has no special restrictions on the mass ratio of graphite, carbon fiber, carbon black and carbon nanotubes to graphene, as long as the heat dissipation effect can be realized. For the graphene contained in the heat dissipation layer, preferably 1 to 50 layers of graphene microsheets or functionalized graphene containi...

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Abstract

The invention discloses an efficient preparation device for a graphene insulating material film and a using method thereof. The efficient preparation device comprises a supporting base and a material mixing structure, wherein the material mixing structure comprises a material mixing shell; the material mixing shell is fixedly connected to the top of the supporting base; the top of the material mixing shell is fixedly connected with a first motor; the output end of the first motor is fixedly connected with a protective shell; the bottom of the protective shell is fixedly connected with a rotating shaft barrel; the surface of the rotating shaft barrel is fixedly connected with a plurality of stirring blades; and a cleaning mechanism is arranged on the surface of the rotating shaft barrel. According to the efficient preparation device disclosed by the invention, the rotating shaft barrel and the stirring blades are used for mixing and stirring a graphene material, and a material conveying auger is used for conveying the graphene material at the lower part of an inner cavity of the material mixing shell to the upper part of an inner cavity of the first motor, so that the graphene material can be transversely stirred and can also be vertically stirred, and therefore, the mixing effect of the graphene material is better, the mixing time of the graphene material is shortened, and the production efficiency of the graphene insulating material film is improved.

Description

technical field [0001] The present application relates to the field of film preparation, in particular to an efficient preparation device for a graphene insulating material film and a method for using the same. Background technique [0002] Graphene has excellent optical, electrical, and mechanical properties, and has important application prospects in materials science, micro-nano processing, energy, biomedicine, and drug delivery. It is considered to be a revolutionary material in the future. Graphene is common The method of powder production is mechanical exfoliation method, redox method, SIC epitaxial growth method, and the film production method is chemical vapor deposition method. Graphene is one of the materials with the highest strength known, and it also has good toughness and can Bending, graphene is a zero-distance semiconductor because its conduction and valence bands meet at the Dirac point, where the edge Brillouin zone of the momentum space at six positions in...

Claims

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Application Information

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IPC IPC(8): B05B9/04B01F5/10B01F7/00B01F7/18B01F15/00B05B15/25B05B16/20B05B16/40B05D1/02B05D3/02B05D3/04C01B32/194
CPCB05B15/25B05B9/0403B05B16/20B05D3/0254B05D3/0413B05D3/002B05D1/02B05B16/40C01B32/194
Inventor 张改燕
Owner 昆山三樱电子科技有限公司
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