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Filtering film system and near infrared spectrum chip based on double glass hole arrays and preparation method thereof

A technology of near-infrared spectroscopy and double-hole arrays, which is applied in the fields of optical filters, spectrometry/spectrophotometry/monochromators, optics, etc., can solve problems such as difficult practical applications and indistinguishable photoelectric detection modules, etc. To achieve the effect of continuous modulation

Inactive Publication Date: 2021-10-12
JILIN QS SPECTRUM DATA TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The same filter component produces two strong transmission peaks, which are indistinguishable for the photodetection module, and only accumulate the transmitted luminous flux of the two bands, and output an electrical signal equivalent to the sum of the two optical signal intensities, which is difficult for practical application

Method used

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  • Filtering film system and near infrared spectrum chip based on double glass hole arrays and preparation method thereof
  • Filtering film system and near infrared spectrum chip based on double glass hole arrays and preparation method thereof
  • Filtering film system and near infrared spectrum chip based on double glass hole arrays and preparation method thereof

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preparation example Construction

[0037] The preparation method of the near-infrared spectrum chip based on the filter film system of the double glass hole array is characterized in that it comprises the following steps:

[0038] S1: Select two pieces of quartz glass that match the size of the detector, and the transmittance T of the quartz glass in the near-infrared band of 1-2 μm is ≥ 90%; one is used as the lower plating plate, and the other is used as the cover plate;

[0039] S2: Deposit a silver film with a thickness of 100nm-500nm on the lower accompanying plate by evaporation;

[0040] S3: Using focused ion beam lithography on the silver film to etch a hole array, the hole array includes a period P and an aperture r, where:

[0041] P=0.66λ-0.025................................1.1

[0042] r=0.2p+0.02................................1.2

[0043] λ is the preset transmission peak wavelength; according to the requirements of the filter chip, the silver film is partitioned, and different regions use diff...

Embodiment 1

[0053] It is required that the λ transmission peak wavelengths are 1.25μm, 1.40μm, 1.55μm, and 1.70μm. Four kinds of transmission peak structures are required, and the detector uses a 30*30mm InGaAs image sensor chip.

[0054] The preparation method of the near-infrared spectrum chip based on the filter film system of the double glass hole array:

[0055] S1: Select two pieces of quartz glass of 30*30mm, the transmittance of said quartz glass in the near-infrared band of 1-2μm is T≥90%; one is used as the lower plating plate, and the other is used as the cover plate;

[0056] S2: Deposit a silver film with a thickness of 200nm (thickness should be greater than the skin depth of silver in the near-infrared band) by evaporation method on the lower accompanying plate;

[0057] S3: Using focused ion beam lithography on the silver film to etch a hole array, the hole array includes a period P and an aperture r, where:

[0058] P=0.66λ-0.025................................1.1

[00...

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Abstract

The invention discloses a filtering film system and a near infrared spectrum chip based on double glass hole arrays and a preparation method thereof, the filtering film system comprises a lower layer accompanying plating sheet adopting a silicon dioxide medium, a silver film plated on the lower layer accompanying plating sheet and a covering sheet plated on the upper layer of the silver film, the covering sheet adopts a silicon dioxide medium, and the silver film is etched with hole arrays. The sub-wavelength hole array structure manufactured by using the principle of a surface plasmon polariton (SPP) has the advantages of natural corrosion resistance, continuous modulation, capability of being applied to near-infrared bands and the like.

Description

technical field [0001] The invention relates to the field of spectral chip manufacturing, in particular to a filter film system based on a double glass hole array, a near-infrared spectral chip and a preparation method thereof. Background technique [0002] Compared with conventional spectral detection equipment, the spectral chip has the advantages of low load, high integration, and low energy consumption. The way of dye or pigment filtering can only filter a few specific wavelengths, and the energy utilization rate is low, and it can only be used in the visible light band, which has great limitations. [0003] The dispersion module of conventional spectral detection equipment is mainly made of chemical dyes or colored glass. Due to the large light loss and poor stability, it cannot withstand long-term strong light irradiation, and the color filtering performance is determined by the molecular characteristics of the material, so it can only filter specific wavelengths. Na...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G01J5/08G01J5/00G01J3/28G01J3/12C23C14/18C23C14/24C23C14/58
CPCG02B5/201G02B5/207G01J3/12G01J3/2823G01J5/00G01J5/0831C23C14/24C23C14/18C23C14/5873G01J2003/1278G01J2003/2826G01J2005/0077
Inventor 宋晨智蔡红星姚治海石晶任玉端木彦旭全王昕瑞韩颖
Owner JILIN QS SPECTRUM DATA TECH CO LTD
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