Novel high-throughput closed microarray printing system
A printing system and microarray technology, applied in printing, printing machines, rotary printing machines, etc., can solve the problems of protein limited spot fixation, poor uniformity between microarray spots, cross-contamination between spots, etc., and achieve a breakthrough in the development of the bottleneck , improve uniformity, and improve the effect of protein immobilization
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[0027] 1. Fabrication of microarray printing plate: use single-side polished silicon wafer as the substrate of SU-8 mold. Preheat the wafer at 95°C for 10 min to drive off surface water and improve adhesion. After the wafer had cooled, SU-8 was added to the wafer and spun at 1300 rpm for 60 s to generate a 100 μm thick layer. The wafer was baked at 65°C for 3 min, then baked at 95°C for 2 h, and then removed to cool. A photomask was applied to the wafer, emulsion side facing SU-8, and covered with a glass plate. 430 mJ / cm using mask alignment system at 365nm 2 dose exposure. After exposure, bake at 65°C for 3 minutes, and bake at 95°C for 15 minutes to complete the crosslinking of the exposed resist. After the wafer was cooled, the wafer was immersed in PGMEA (propylene glycolmonomethyl ether acetate) for 20 min to develop, and the wafer was cleaned with isopropanol and dried in a nitrogen drying oven. After the wafer was dried, the wafer was placed in a fluorosilane (Tri...
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