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Transfer method for achieving smooth self-supporting film through external pressure and self-supporting film

A self-supporting film and external pressure technology, applied in ion implantation plating, gaseous chemical plating, coating, etc., can solve the problems of being unable to maintain atomic level flatness, achieve improved flatness, simple operation specifications, and reduce fluctuations Effect

Inactive Publication Date: 2021-10-29
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In order to overcome problems such as the inability to maintain atomic-level flatness and the need to use adhesives during the preparation of self-supporting films, the present invention provides a method for realizing the transfer of two-dimensional self-supporting films by applying external pressure, avoiding the intervention of organic substances, and obtaining The two-dimensional self-supporting film that is tightly bonded to the silicon wafer can transfer a film with a clean surface, a large effective area, and good flatness in a short period of time

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  • Transfer method for achieving smooth self-supporting film through external pressure and self-supporting film
  • Transfer method for achieving smooth self-supporting film through external pressure and self-supporting film
  • Transfer method for achieving smooth self-supporting film through external pressure and self-supporting film

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Embodiment Construction

[0044] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Those who do not indicate the specific conditions in the examples are carried out according to the conventional conditions or the conditions suggested by the manufacturer. The reagents or instruments used were not indicated by the manufacturer, and they were all conventional products that could be purchased from the market.

[0045]The invention provides a flat self-supporting film transfer method realized by external pressure. By applying pressure to the target substrate and the film to be transferred to make them fully and closely contact, the full bonding of the film to be transferred and the target contrast is realized, but in microscopic There is still a certain gap on the surface. Since the two interfaces have a certain degree of wett...

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Abstract

The invention discloses a transfer method for achieving smooth self-supporting film through external pressure and a self-supporting film obtained through the method. The transfer method of the self-supporting film comprises the steps: a target substrate and a to-be-transferred film are clamped through an aluminum clamp, adequate attachment of the to-be-transferred film and a target contrast is achieved, then the clamp is soaked in deionized water, and the self-supporting film adsorbed on the target substrate is obtained; the clamp is placed in nitrogen flow, and water stains near the clamp and the target substrate are removed; and the clamp is detached, the obtained self-supporting film attached to the target substrate is subjected to ultrasonic treatment in acetone, isopropanol and deionized water, and the self-supporting film is obtained. According to the two-dimensional ultrathin perovskite thin film, a strontium titanate substrate is adopted, the film is barium titanate, and the target substrate is a silicon substrate; and according to the method, the smoothness of the self-supporting film can be improved, and the transfer area of the self-supporting film is greatly increased.

Description

technical field [0001] The invention relates to the technical field of self-supporting oxide film transfer, in particular to a flat self-supporting film transfer method realized by external pressure and a self-supporting film obtained by the method. Background technique [0002] For transition metal oxide perovskites, the rich properties including giant magnetoresistance and multiferroicity generated by strongly interacting electrons in d orbitals have attracted extensive attention in the past nearly a century. By using a water-soluble sacrificial layer, the preparation of self-supporting two-dimensional perovskite films can be realized. The new fundamental properties exhibited by this 2D material support the development of multifunctional electronic devices. free-standing strontium titanate (SrTiO 3 ) two-dimensional film as an example, the transferred two-dimensional strontium titanate film can exhibit pure in-plane ferroelectric polarization under the condition of exter...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/00C23C14/08C23C16/01C23C16/40H01L27/11502H01L27/11585H10B51/00H10B53/00
CPCC23C14/0005C23C16/01C23C14/08C23C16/40H10B53/00H10B51/00
Inventor 聂越峰杨江枫
Owner NANJING UNIV
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