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Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer

A technology of plasma layer and extreme ultraviolet light, which is applied in photometry and ultraviolet measurement using electric radiation detectors, can solve the problems of signal receiving and decoding operation influence, low anode resolution, disordered distribution, etc., and achieve higher relative intensity , Uniform resolution and better resolution

Pending Publication Date: 2021-11-09
BEIJING RES INST OF SPATIAL MECHANICAL & ELECTRICAL TECH
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  • Application Information

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Problems solved by technology

[0004] The advantages of the above-mentioned detector components are high resolution, good gain, low noise, etc., but the disadvantage is that the messy distribution of the electron beam signal at the output end of the MCP will affect the signal reception and decoding operation of the encoding anode and subsequent circuits, requiring more complex Circuit design to solve this problem; low anode resolution and low duty cycle

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  • Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer
  • Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer
  • Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer

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Embodiment 1

[0035] The present invention provides a fourth-order curved microchannel plate (MCP) for the detection of extreme ultraviolet light in the earth's plasma layer, hereinafter referred to as the MCP component, and the MCP component is installed on the back-end detector. figure 1 It is a schematic diagram of the position of the fourth-order curved microchannel plate (MCP) used for the detection of the earth's plasma layer extreme ultraviolet light according to the present invention. It can be seen from the figure that, the same as the prior art, the fourth-order curved microchannel plate is installed on the camera rear end circuit code before the anode.

[0036] Such as Figure 4As shown, the MCP assembly includes a photocathode coating 1, a first-order MCP2, a second-order MCP3, a third-order MCP4, and a fourth-order MCP5, and in the first-order MCP2, second-order MCP3, third-order MCP4, and fourth The surface of the MCP component after MCP5 coupling is coated with a photocathod...

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Abstract

The invention provides a multi-order curved surface micro-channel plate for extreme ultraviolet light detection of an earth plasma layer, and aims to realize collimation and multiplication of incident electrons by designing a coupling mode, a curvature radius and micro-channel parameters of a multi-order MCP. The device can overcome the defects that electron beam signals at the output end of a traditional MCP assembly are distributed in a disordered mode, the anode resolution ratio is low, and the duty ratio is low, the dispersion degree of electron beams output by the curved-surface microchannel plate MCP assembly is further reduced, the signal multiplication and signal collimation effects are good, and the anode resolution ratio is high.

Description

technical field [0001] The invention relates to the field of optical imaging devices, in particular to a multi-order curved microchannel plate used for detecting extreme ultraviolet light in the earth's plasma layer. Background technique [0002] The earth's plasma layer is an important part of the coupling of the inner magnetosphere. It is the area closest to the earth in the magnetosphere, and it is also adjacent to the ionosphere of the earth's atmosphere. It is mainly located at 3.0Re~6.0Re (Re=6378km) on the magnetic equator . Therefore, the position, shape and change of the plasma layer are closely related to geomagnetic activity, solar activity, solar wind intensity, and interstellar magnetic field. in accordance with. At present, the detection of the earth's plasma layer mainly uses the fixed-frequency extreme ultraviolet radiation radiated by the ions in the plasma layer under the excitation of solar radiation to image the plasma layer. Because EUV photons are no...

Claims

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Application Information

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IPC IPC(8): G01J1/42
CPCG01J1/429
Inventor 粘伟郑国宪蔡华单睿刘辉
Owner BEIJING RES INST OF SPATIAL MECHANICAL & ELECTRICAL TECH
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