Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer

A technology of plasma layer and extreme ultraviolet light, which is applied in photometry and ultraviolet measurement using electric radiation detectors, can solve the problems of signal receiving and decoding operation influence, low anode resolution, disordered distribution, etc., and achieve higher relative intensity , Uniform resolution and better resolution

Pending Publication Date: 2021-11-09
BEIJING RES INST OF SPATIAL MECHANICAL & ELECTRICAL TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The advantages of the above-mentioned detector components are high resolution, good gain, low noise, etc., but the disadvantage is that the messy distribution of the electron beam signal at the output end o

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer
  • Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer
  • Multi-order curved surface micro-channel plate for extreme ultraviolet light detection of earth plasma layer

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0034] Example 1

[0035] The present invention provides a four-order curved microchannel plate (MCP) for Earth Plasma laminate ultraviolet light detection, hereinafter referred to as the MCP assembly, the MCP assembly is mounted on the rear end detector, figure 1 A positional view of the four-order curved surface microchannel plate (MCP) for the present invention for the Earth's plasma laminate ultraviolet light, is known, the same as the prior art, the fourth-order surface microchannel plate is mounted in the camera rear end circuit encoding The anode before.

[0036] like Figure 4As shown, the MCP assembly includes a photovoltaic plating layer 1, a first order MCP2, a second order MCP3, a third order MCP4, and a fourth order MCP5 and in the first step MCP2, the second order MCP3, the third order MCP4, the fourth order. The MCP assembly surface plated light cathode plating layer after the MCP5 coupled.

[0037] like image 3 The optical path diagram of the fourth-order curved su...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Outer diameteraaaaaaaaaa
Login to view more

Abstract

The invention provides a multi-order curved surface micro-channel plate for extreme ultraviolet light detection of an earth plasma layer, and aims to realize collimation and multiplication of incident electrons by designing a coupling mode, a curvature radius and micro-channel parameters of a multi-order MCP. The device can overcome the defects that electron beam signals at the output end of a traditional MCP assembly are distributed in a disordered mode, the anode resolution ratio is low, and the duty ratio is low, the dispersion degree of electron beams output by the curved-surface microchannel plate MCP assembly is further reduced, the signal multiplication and signal collimation effects are good, and the anode resolution ratio is high.

Description

technical field [0001] The invention relates to the field of optical imaging devices, in particular to a multi-order curved microchannel plate used for detecting extreme ultraviolet light in the earth's plasma layer. Background technique [0002] The earth's plasma layer is an important part of the coupling of the inner magnetosphere. It is the area closest to the earth in the magnetosphere, and it is also adjacent to the ionosphere of the earth's atmosphere. It is mainly located at 3.0Re~6.0Re (Re=6378km) on the magnetic equator . Therefore, the position, shape and change of the plasma layer are closely related to geomagnetic activity, solar activity, solar wind intensity, and interstellar magnetic field. in accordance with. At present, the detection of the earth's plasma layer mainly uses the fixed-frequency extreme ultraviolet radiation radiated by the ions in the plasma layer under the excitation of solar radiation to image the plasma layer. Because EUV photons are no...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01J1/42
CPCG01J1/429
Inventor 粘伟郑国宪蔡华单睿刘辉
Owner BEIJING RES INST OF SPATIAL MECHANICAL & ELECTRICAL TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap