Preparation method of machinable diamond/metal matrix composite material
A technology of mechanical processing and composite materials, applied in metal material coating technology, coating, gaseous chemical plating, etc., can solve problems such as processing difficulty
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Embodiment 1
[0040] Preparation of Doped Diamond Particles
[0041] Using single crystal diamond particles with a particle size of 500 μm as the raw material, a polycrystalline diamond transition layer is first deposited on the surface of the diamond particles by chemical deposition, and the mass flow ratio of the atmosphere is CH 4 :H 2 =2:98, the deposition temperature is 800° C., the growth times are 2 times, and the single deposition time is 10 minutes to obtain a polycrystalline diamond transition layer with a thickness of 200 nm.
[0042] Then use hot wire chemical vapor deposition to grow a doped diamond shell layer on the surface of the polycrystalline diamond transition layer to obtain doped diamond particles. Deposition process parameters: hot wire distance 10 mm, hot wire thickness 0.5 mm, growth temperature 850 ° C, deposition pressure 3 KPa, diamond film thickness 2 μm obtained by controlling deposition time; during the chemical vapor deposition, the mass flow ratio of the pa...
Embodiment 2
[0047] Preparation of Doped Diamond Particles
[0048] Using 400um single crystal diamond particles as the raw material, the polycrystalline diamond transition layer is first deposited on the surface of the diamond particles by chemical deposition. The process is as follows: the mass flow rate of the atmosphere is CH 4 :H 2 =2:98, the number of growths is 2 times, each growth time is 20min, and finally a polycrystalline diamond transition layer with a thickness of 400nm is obtained.
[0049] Then use hot wire chemical vapor deposition to grow a doped diamond shell layer on the surface of the polycrystalline diamond transition layer to obtain a diamond reinforcement. Deposition process parameters: hot wire distance 10mm, hot wire thickness 0.5mm, growth temperature 850°C, deposition pressure 3KPa, diamond film thickness 3μm obtained by controlling the deposition time; during the chemical vapor deposition, the growth deposition is divided into three stages, the first During de...
Embodiment 3
[0054] Preparation of diamond reinforcement
[0055] Using 300um single crystal diamond particles as the raw material, the polycrystalline diamond transition layer is first deposited on the surface of the diamond particles by chemical deposition. The process is as follows: the mass flow rate of the atmosphere is CH 4 :H 2 =2:98, the number of growths is 2 times, each growth time is 20min, and finally a polycrystalline diamond transition layer with a thickness of 400nm is obtained.
[0056] Then use hot wire chemical vapor deposition to grow a doped diamond shell layer on the surface of the polycrystalline diamond transition layer to obtain a diamond reinforcement. Deposition process parameters: hot wire distance 10mm, hot wire thickness 0.5mm, growth temperature 850°C, deposition pressure 3KPa, diamond film thickness 2μm obtained by controlling the deposition time; during the chemical vapor deposition, the mass flow ratio of the passing gas is CH 4 :H 2 :B 2 h 6 =2:97:1, ...
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