Heater and aerosol generating device
A heater and aerosol technology, applied to tobacco and other directions, can solve the problems of uneven heating and insufficient penetration, and achieve the effects of short preheating time, high core temperature and uniform heating
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Embodiment approach 1
[0023] Can refer to figure 1 Embodiment 1 of the present application provides a heater for heating the aerosol-forming substrate by infrared radiation, and volatilizes at least one component in the aerosol-forming substrate to form an aerosol for the user to inhale; the heater 1 includes a substrate 11, an infrared The electrothermal film 12 and the conductive part (13, 14).
[0024] The base body 11 forms a space for containing the aerosol-forming substrate, and the inner surface of the base body 11 forms at least a part of the boundary of the space. The base body 11 has opposite first and second ends, the base body 11 extends longitudinally between the first end and the second end, and has a hollow cavity inside which is suitable for accommodating an aerosol-forming base. The base body 11 may be in the shape of a cylinder, a prism or other columns. The base body 11 is preferably in the shape of a cylinder, and the chamber is a cylindrical hole that runs through the middle ...
Embodiment 1
[0044] The tin oxide is selected to be doped with P element and C element, and the infrared electrothermal film 12 is prepared on the substrate 11 (quartz tube) by magnetron sputtering. Wherein, the inner diameter of the quartz tube is 7.2 mm, the outer diameter is 9.2 mm, and the height is 29 mm.
[0045] Specifically, the magnetron sputtering coating equipment is a magnetron sputtering coating equipment with an anode ion source, the anode voltage of the anode ion source is 1500V, and the anode current is 0.3A; the magnetron sputtering power supply adopts a 3kW bipolar pulse DC power supply.
[0046] On the one hand, the anode ion source can generate high-energy plasma to etch and plasma clean the surface of the workpiece to ensure the cleanness of the molecular weight level of the workpiece surface, laying the foundation for excellent film-base bonding performance; on the other hand, the anode ion source can make methane, acetylene, NH3 , PH3 and other gases are decomposed, ...
Embodiment 2
[0059] The tin oxide is selected to be doped with P element, C element and Ca element, and the infrared electrothermal film 12 is prepared on the substrate 11 (quartz tube) by chemical vapor deposition. Wherein, the inner diameter of the quartz tube is 7.2 mm, the outer diameter is 9.2 mm, and the height is 29 mm.
[0060] The preparation process is as follows:
[0061] Using SnCl4 5H2O, concentrated H3PO4, isopropanol and a small amount of CaCl2 solution as raw materials, water as a solution, the concentration of SnCl4 is 1mol / L, the concentration of H3PO4 is 0.2mol / L, the concentration of isopropanol is 0.15mol / L, CaCl2 A mixed solution with a concentration of 0.03mol / L; the mixed solution is heated to 400-700°C, typically, heated to 600°C; the mixed solution forms vaporized smoke at high temperature;
[0062] heating the temperature of the substrate 11 to 300-600°C, typically to 500°C;
[0063] Using Ar and O2 as the carrier gas, the flow rate of Ar and O2 is 50sccm; the ...
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