Method for preparing large-area nano-metal photonic crystal by hot-pressing printing

A photonic crystal and nano-metal technology, which is applied in optics, optical components, opto-mechanical equipment, etc., can solve the problems that the spatial size of the light spot cannot be too large, it is difficult to prepare metal nanostructures, and the quality of metal photonic crystals is affected, and the preparation cycle is achieved. Short, simple process, easy to emboss effect

Active Publication Date: 2022-01-28
BEIJING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the photoresist used in photolithography is difficult to remove completely, which affects the quality of the final metal photonic crystal
At the same time, when using interference lithography, in order to ensure the interference effect, the spatial size of the spot should not be too large, so it is difficult to prepare large-area (centimeter-sized) metal nanostructures
Metal photonic crystals prepared by electron beam etching technology have the advantages of high resolution and steep line edges, but the preparation cost is high, especially for the preparation of large-area gratings, the preparation cost will increase by orders of magnitude, which is difficult to meet the needs of practical applications

Method used

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  • Method for preparing large-area nano-metal photonic crystal by hot-pressing printing
  • Method for preparing large-area nano-metal photonic crystal by hot-pressing printing
  • Method for preparing large-area nano-metal photonic crystal by hot-pressing printing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] 1) Use indium tin oxide (ITO) glass as a substrate, ultrasonically in acetone and ethanol for 15 minutes to remove dust and oil on the surface, and place it on a heating platform with a temperature of 100°C.

[0026] 2) Select gold nanoparticles coated with hexanethiol, use xylene as the solvent, prepare a gold solution with a concentration of 100 mg / ml, and sonicate for 15 minutes to prevent the nanoparticles from agglomerating.

[0027] 3) Take 10 μl of the metal nanoparticle solution configured in step 2) and drop it on the ITO substrate in step 1) (the side coated with the ITO film faces up), and while the metal nanoparticle solution is still wet, use a 600nm cycle The PDMS grating is used as a template. When pressing, ensure that the direction of the grating lines is parallel to the direction of the pressing force, the pressure is 10N, and the pressing time is 1 min.

[0028] 4) Remove the embossed template and ITO substrate from the heating table at the same time,...

Embodiment 2

[0031] 1) Indium tin oxide (ITO) glass was used as the substrate (same as Example 1), ultrasonicated in acetone and ethanol for 15 minutes to remove dust and oil on the surface, and placed on a heating table with a temperature of 100°C.

[0032] 2) Select gold nanoparticles coated with hexanethiol, use xylene as the solvent, prepare a gold solution with a concentration of 50 mg / ml, and sonicate for 15 minutes to prevent the nanoparticles from agglomerating.

[0033] 3) Take 10 μl of the metal nanoparticle solution configured in step 2) and drop it on the ITO substrate in step 1) (the side coated with the ITO film faces up), and while the metal nanoparticle solution is still wet, use a 600nm cycle The PDMS grating is used as a template. When pressing, ensure that the direction of the grating lines is parallel to the direction of the pressing force, the pressure is 10N, and the pressing time is 1 min.

[0034] 4) Remove the embossed template and ITO substrate in step 3) from the...

Embodiment 3

[0037] Below in conjunction with embodiment further illustrate the present invention, but the present invention is not limited to this embodiment.

[0038] The invention discloses a method for preparing a large-area nanometer metal grating by hot embossing, and the specific implementation example 3 is as follows:

[0039] 1) Use indium tin oxide (ITO) glass as a substrate, ultrasonically in acetone and ethanol for 15 minutes to remove dust and oil on the surface, and place it on a heating table with a temperature of 110°C.

[0040] 2) Select gold nanoparticles coated with hexanethiol, use xylene as solvent, prepare a gold solution with a concentration of 150 mg / ml, and sonicate for 15 minutes to prevent the nanoparticles from agglomerating.

[0041] 3) Take 10 μl of the metal nanoparticle solution configured in step 2) and drop it on the ITO substrate in step 1) (the side coated with the ITO film faces up), and while the metal nanoparticle solution is still wet, use a 600nm cy...

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PUM

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Abstract

The invention discloses a method for preparing a large-area nano-metal photonic crystal by hot-pressing printing, and belongs to the technical field of metal photonic crystals. The method comprises the following steps: directly dripping a metal nanoparticle solution on an indium tin oxide (ITO) substrate, adopting a PDMS template with a nano structure, realizing transfer printing of the nano structure by utilizing a hot stamping technology, and finally performing annealing to obtain the metal photonic crystal with the same nano structure as the template. The method can be used for preparing the large-area nano metal photonic crystal, and has the advantages of simplicity, high efficiency and low cost.

Description

technical field [0001] The invention belongs to the technical field of metal photonic crystals, and in particular relates to a method for preparing large-area nanometer metal photonic crystals simply and quickly by using hot embossing technology. Background technique [0002] Metal photonic crystals are structures such as metal nanowires, nanocolumns, and nanodisks that are periodically arranged on the subwavelength scale, and have potential applications in optical switches, optical filter devices, and polarization devices. The existing metal photonic crystal preparation methods mainly include interference photolithography and electron beam etching. Among them, the method of preparing metal photonic crystals by using interference lithography technology can prepare metal nanostructures with different periodic structures by flexibly changing the optical path. However, the photoresist used in photolithography is difficult to remove completely, which affects the quality of the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00G03F7/00
CPCG02B1/005G03F7/0002
Inventor 窦菲彭晨张新平
Owner BEIJING UNIV OF TECH
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