A semiconductor structure with low internal loss, low resistance and high efficiency and its preparation method

A semiconductor and low-resistance technology, applied in the field of low-internal loss, low-resistance, high-efficiency semiconductor structure and its preparation, can solve the problems that the luminous efficiency of light-emitting semiconductor devices needs to be improved, so as to optimize series resistance and internal loss, reduce internal loss, and improve The effect of luminous efficiency

Active Publication Date: 2022-04-12
SUZHOU EVERBRIGHT PHOTONICS CO LTD +1
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the luminous efficiency of current light-emitting semiconductor devices still needs to be improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A semiconductor structure with low internal loss, low resistance and high efficiency and its preparation method
  • A semiconductor structure with low internal loss, low resistance and high efficiency and its preparation method
  • A semiconductor structure with low internal loss, low resistance and high efficiency and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] In addition to power and wavelength, the electro-optical conversion efficiency is the most important indicator of light-emitting semiconductor structures, which directly affects the power consumption and reliability of light-emitting semiconductor structures. The light-emitting semiconductor structure with high electro-optical efficiency not only has less waste heat and high reliability, but also can simplify the thermal management system of the whole system, greatly improving the application level of the light-emitting semiconductor structure. The following is the electrical-to-optical conversion efficiency formula of a light-emitting semiconductor structure:

[0028]

[0029] The electro-optical conversion efficiency that determines the light-emitting semiconductor structure is mainly divided into four items, the first item is the internal quantum efficiency ; The second term is the loss of the resonant cavity of the light-emitting semiconductor structure ; The ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a semiconductor structure with low internal loss, low resistance and high efficiency and its preparation method, comprising: a semiconductor substrate layer; a first confinement layer located on the semiconductor substrate layer; a confinement layer located on the first confinement layer away from the semiconductor substrate The first waveguide layer on the side of the bottom layer; the active layer on the side of the first waveguide layer away from the first confinement layer; the second waveguide layer on the side of the active layer away from the first waveguide layer ; The second confinement layer located on the side away from the active layer of the second waveguide layer; the first confinement layer, the first waveguide layer, the active layer, the second waveguide layer, and the second confinement layer have a characteristic optical field , in the epitaxial thickness direction, the doping concentration of the first confinement layer, the first waveguide layer, the second waveguide layer and the second confinement layer decreases as the intensity of the characteristic light field increases. The luminous efficiency of the semiconductor structure with low internal loss, low resistance and high efficiency is effectively improved.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a semiconductor structure with low internal loss, low resistance and high efficiency and a preparation method thereof. Background technique [0002] A light-emitting semiconductor device is a device that produces stimulated emission with a certain semiconductor material as a working substance. Its working principle is: through a certain excitation method, between the energy band (conduction band and valence band) of the semiconductor material, or Between the energy band of the material and the energy level of the impurity (acceptor or donor), the particle number inversion of the non-equilibrium carrier is realized. When a large number of electrons and holes in the particle number inversion state recombine, stimulated emission occurs Because of its small size and high electro-optical conversion efficiency, light-emitting semiconductor devices are widely used. [0003] Howe...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/20H01S5/343
CPCH01S5/2004H01S5/2031H01S5/2054H01S5/34313
Inventor 王俊谭少阳周立丁永康肖垚廖新胜闵大勇
Owner SUZHOU EVERBRIGHT PHOTONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products