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Method for preparing two-dimensional layered silicon nanosheet material based on topological chemical method

A two-dimensional layered, topological chemistry technology, applied in chemical instruments and methods, nanotechnology for materials and surface science, inorganic chemistry, etc., can solve problems such as Si layer oxidation, and achieve increased specific surface area and productivity. High, simple equipment effect

Pending Publication Date: 2022-03-01
TAIYUAN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the existing problems in the prior art, and provides a method for preparing two-dimensional layered silicon nanosheet materials based on topological chemistry, which solves the problem that the Si layer is oxidized during the intercalation and stripping of precursors. The preparation method Relatively simple, strong maneuverability, high yield, the prepared silicon nanosheet material has the advantages of retaining a large number of active sites and surface functional groups, adjustable surface functional groups, increased specific surface area, thinner sheets, etc.

Method used

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  • Method for preparing two-dimensional layered silicon nanosheet material based on topological chemical method
  • Method for preparing two-dimensional layered silicon nanosheet material based on topological chemical method
  • Method for preparing two-dimensional layered silicon nanosheet material based on topological chemical method

Examples

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Effect test

Embodiment 1

[0041] (1) Weigh 0.4g of sodium hydroxide and dissolve it in 50mL of deionized water to prepare a 2mol / L sodium hydroxide solution, weigh 1.2g of calcium silicide and dissolve it in 50mL of sodium hydroxide solution, fully stir it and let it stand After a while, suction filtration was performed and placed in a blast drying oven at 60°C for 1 hour to obtain purified calcium silicide;

[0042] (2) Weigh 0.8g of stannous chloride and dissolve it in 40mL of ethanol, add 0.2g of calcium silicide and 0.01g of sodium dodecyl sulfate (SDS), and fully stir to obtain a certain concentration of the reaction precursor;

[0043] (3) Put the prepared reaction precursor solution in a water bath at 60°C to react for 600 minutes. After the reaction is complete, a homogeneous solution with a certain concentration is obtained;

[0044] (4) Washing and centrifuging the homogeneous solution at a speed of 8000 rpm, using ethanol as a detergent for the first three times, and washing with a mixed sol...

Embodiment 2

[0046] (1) Weigh 0.4g of sodium hydroxide and dissolve it in 50mL of deionized water to prepare a 2mol / L sodium hydroxide solution, weigh 1.2g of calcium silicide and dissolve it in 50mL of sodium hydroxide solution, fully stir it and let it stand After a while, suction filtration was performed and placed in a blast drying oven at 60°C for 1 hour to obtain purified calcium silicide;

[0047] (2) Weigh 0.9g of stannous chloride and dissolve it in 60mL of ethanol, add 0.2g of calcium silicide and 0.05g of sodium dodecylbenzenesulfonate (SDBS), and stir well to obtain a certain concentration of the reaction precursor ;

[0048] (3) Put the prepared reaction precursor solution in a water bath at 60°C to react for 600 minutes. After the reaction is complete, a homogeneous solution with a certain concentration is obtained;

[0049] (4) Washing and centrifuging the homogeneous solution at a speed of 6000 rpm, using ethanol as a detergent for the first three times, and washing with a...

Embodiment 3

[0051] (1) Weigh 0.4g of sodium hydroxide and dissolve it in 50mL of deionized water to prepare a 2mol / L sodium hydroxide solution, weigh 1.2g of calcium silicide and dissolve it in 50mL of sodium hydroxide solution, fully stir it and let it stand After a while, suction filtration was performed and placed in a blast drying oven at 60°C for 1 hour to obtain purified calcium silicide;

[0052] (2) Weigh 1.14g of stannous chloride and dissolve it in 70mL of methanol, add 0.2g of calcium silicide and 0.1g of dispersant SDS to it, and fully stir to obtain a certain concentration of the reaction precursor;

[0053] (3) Put the prepared reaction precursor solution in a water bath at 60°C to react for 600 minutes. After the reaction is complete, a homogeneous solution with a certain concentration is obtained;

[0054] (4) Wash and centrifuge the homogeneous solution at a speed of 8000 rpm, use methanol as a detergent for the first three times, and use a mixed solution of 3% hydrochlor...

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Abstract

The invention discloses a method for preparing a two-dimensional layered silicon nanosheet material based on a topological chemical method. According to the method, a topological chemical method is adopted, the tin ions enter the interior of a calcium silicide structure, so that the calcium ions are replaced, then the tin ions are washed away through a mixed solution of hydrochloric acid and an oxidizing agent with different concentrations, and a mutually separated silicon lamellar structure is formed, so that the silicon nanosheet material is obtained. The method has the advantages of mild reaction conditions, short reaction time, no need of nitrogen protection, simple required equipment and convenient operation, is beneficial to large-scale preparation of the two-dimensional layered silicon nanosheet material, and can be used for large-scale industrial production. The silicon nanosheet material prepared by the method has the advantages that a large number of active sites and surface functional groups are reserved, the types of the surface functional groups are adjustable, the specific surface area is increased, the sheet layer is thin and the like.

Description

technical field [0001] The invention relates to the technical field of silicon nanosheet material preparation, in particular to a method for preparing a two-dimensional layered silicon nanosheet material based on a topological chemistry method. Background technique [0002] Silicon atoms are arrayed in a honeycomb pattern in the crystal lattice, forming a silicon nanosheet material, which has a graphene-like structure and a two-dimensional sheet structure. The silicon nanosheet material system has some unique characteristics: for example, the spin-orbit interaction of silicon nanosheets is better, and because the covalent bonds between silicon atoms are longer in silicon nanosheets, the silicon nanosheets The interlayer atoms are warped in the shape of "pea pods". Another example is that the silicon material has a traditional diamond structure. Compared with silicon nanosheets, the van der Waals force of interlayer interaction can make metal ions move freely between materia...

Claims

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Application Information

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IPC IPC(8): C01B33/021B82Y30/00B82Y40/00
CPCC01B33/021B82Y30/00B82Y40/00
Inventor 刘菲赵彦亮谭俊华朱开金
Owner TAIYUAN INST OF TECH
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