Monocrystalline silicon alkali polishing additive and use method thereof

A single crystal silicon alkali and additive technology, which is applied in the field of solar cells, can solve problems such as unevenness, thin oxide layer, and battery failure, and achieve the effects of reducing environmental pollution, improving polishing effect, and protecting against damage

Pending Publication Date: 2022-04-15
嘉兴市小辰光伏科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this process will destroy the silicon oxide on the front side. At present, photovoltaic companies will re-oxidize the silicon wafer after laser SE treatment, but the oxide layer at the electrode position is very thin and uneven after oxidation.
The conventional alkali polishing process will still destroy the front PN junction, eventually leading to battery failure

Method used

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  • Monocrystalline silicon alkali polishing additive and use method thereof
  • Monocrystalline silicon alkali polishing additive and use method thereof
  • Monocrystalline silicon alkali polishing additive and use method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Dissolve 50 g of ammonium persulfate, 50 g of polyepoxysuccinic acid, 25 g of glucose, 5 g of sodium dodecylbenzenesulfonate, 15 g of sodium benzoate, and 50 g of sodium lactate into 5 L of deionized water, and stir evenly to obtain an alkali polishing additive.

[0028] Add 12L of sodium hydroxide (45% solid content) and 3L of alkali polishing additive into 330L of deionized water to obtain an alkali polishing solution, and raise the temperature to 65°C. Then put the PSG-removed silicon wafer into it for polishing after pre-cleaning, and then successively wash with deionized water, post-clean, wash with deionized water, pickle, wash with deionized water, and then dry after slow pulling. The weight loss of the prepared silicon wafer was measured, the size of the lattice base was detected by a scanning electron microscope, and the reflectance was measured by a D8 reflectance meter.

Embodiment 2

[0030] Dissolve 50 g of sodium percarbonate, 50 g of polyaspartic acid, 25 g of glucose, 5 g of alkyl glycosides, 15 g of sodium benzoate, and 50 g of sodium lactate into 5 L of deionized water, and stir evenly to obtain an alkali polishing additive.

[0031] Add 12L of sodium hydroxide (45% solid content) and 3L of alkali polishing additive into 330L of deionized water to obtain an alkali polishing solution, and raise the temperature to 65°C. Then put the PSG-removed silicon wafer into it for polishing after pre-cleaning, and then successively wash with deionized water, post-clean, wash with deionized water, pickle, wash with deionized water, and then dry after slow pulling. The weight loss of the prepared silicon wafer was measured, the size of the lattice base was detected by a scanning electron microscope, and the reflectance was measured by a D8 reflectance meter.

[0032] figure 1 It is the reflectance diagram of the polished surface of the silicon wafer prepared in Exa...

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Abstract

The invention discloses a monocrystalline silicon alkali polishing additive and a use method, and the monocrystalline silicon alkali polishing additive comprises the following components by weight: 2-4% of a reaction catalyst, 1-2% of a corrosion and scale inhibitor, 0.1-0.5% of a surfactant, 0.5-2% of an inorganic salt, and the balance deionized water. Compared with a traditional acid polishing process, the monocrystalline silicon alkali polishing additive and the use method have the advantages that environmental pollution is reduced, and meanwhile, the over-etching problem in the alkali polishing process is solved. The additive can improve the back polishing effect of the silicon wafer in the alkali polishing process, and meanwhile can protect a PN junction on the front face of the silicon wafer from being damaged.

Description

technical field [0001] The invention belongs to the technical field of solar cells, and in particular relates to a monocrystalline silicon alkali polishing additive and a using method thereof. Background technique [0002] Energy crisis and environmental pollution have become common problems faced by all countries in the world today. Compared with traditional fuels, solar energy has attracted widespread attention due to its non-polluting, renewable and other advantages, and has gradually become one of the important new energy sources, and the solar photovoltaic industry has also developed rapidly. [0003] In the field of solar cells, improving the conversion efficiency of crystalline silicon solar cells is an important research direction for photovoltaic researchers. In the manufacturing process of crystalline silicon solar cells, in order to improve the photoelectric conversion efficiency of solar cells, the back of the diffused silicon wafer is often polished to improve ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/04
Inventor 周浩陈心浩吴家阳彭丽王涛韩军常帅锋
Owner 嘉兴市小辰光伏科技有限公司
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