A method based on first-principles computational design to confine metal oxide agglomeration by low-valent metal ion doping
A metal ion, first-class technology, applied in the field of limiting metal oxide agglomeration, can solve problems such as oxide agglomeration
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specific Embodiment approach 1
[0024] Embodiment 1: This embodiment is a method for limiting the agglomeration of metal oxides by doping low-valent metal ions based on first-principles calculations. Specifically, it is carried out according to the following steps:
[0025] 1. Using the CASTEP module of Materials Studio software, the PBE functional of the generalized gradient approximation (GGA) is used to describe the exchange interaction between electrons. Based on the first principle, the geometry of the ZnO unit cell is optimized to obtain the most stable ZnO in total energy. unit cell, and three key parameters to balance the calculation efficiency and calculation accuracy are determined through the gradient parameter convergence test: k-point is 6 × 6 × 6, which represents the density of grid division in the calculation model; cut-off is 450eV ( truncation energy), each K point can be expanded with a discrete plane wave basis set, and theoretical expansion requires an infinite number of plane waves. Beca...
specific Embodiment approach 2
[0034] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the metal ion M described in step 4 is Li + . Others are the same as the first embodiment.
specific Embodiment approach 3
[0035] Embodiment 3: The difference between this embodiment and Embodiment 1 is that the metal ion M described in step 4 is Ag + . Others are the same as the first embodiment.
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