Environment-friendly high-Tg low-dielectric copper-clad plate and preparation process thereof
A preparation process and low-dielectric technology, applied in electrophoretic plating, electrolytic coatings, coatings, etc., can solve the problems of low glass transition temperature, poor heat resistance, and increased dielectric loss of copper clad laminates, and improve the electrical conductivity. performance, improve flame retardant performance, reduce the effect of dielectric loss
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Embodiment 1
[0031] A preparation process of an environment-friendly high Tg low dielectric copper clad laminate, comprising the following steps:
[0032] (1) Preparation of microsphere filler: Weigh the following raw materials in parts by weight, SiO 2 for 70 copies, B 2 o 3 The content is 20 parts, Na 2 O is 3 parts, K 2 O is 0.5 part, BaO is 0.5 part; mix each component evenly and add it into the melting furnace, the temperature in the melting furnace is controlled at 1450 ° C, until it is completely melted, quenched, crushed and classified, and the filler with a particle size of 1-10 μm is obtained Particles, the filler particles are transported to the spheroidizing furnace, spheroidized for 1 hour at a temperature of 1320 ° C, and cooled rapidly to obtain microsphere fillers;
[0033] (2) Preparation of electrophoretic fluid: the microsphere filler prepared by step (1) is dissolved in a mixed acid solution of sulfuric acid and nitric acid with a mass ratio of 3:1, activated for 2h...
Embodiment 2
[0043] A preparation process of an environment-friendly high Tg low dielectric copper clad laminate, comprising the following steps:
[0044] (1) Preparation of microsphere filler: Weigh the following raw materials in parts by weight, SiO 2 for 72 copies, B 2 o 3 The content is 20 parts, Na 2 O is 5 parts, K 2 O is 1 part, BaO is 0.7 part; mix each component evenly and add it into the melting furnace, the temperature in the melting furnace is controlled at 1470 ° C, until it is completely melted, quenched, crushed and classified, and the filler with a particle size of 1-10 μm is obtained Particles, transport the filler particles to a spheroidizing furnace, spheroidize for 2 hours at a temperature of 1350°C, and cool rapidly to obtain microsphere fillers;
[0045] (2) Preparation of electrophoretic solution: the microsphere filler prepared in step (1) is dissolved in a mixed acid solution of sulfuric acid and nitric acid with a mass ratio of 3:1, activated for 2.5h, filtere...
Embodiment 3
[0055] A preparation process of an environment-friendly high Tg low dielectric copper clad laminate, comprising the following steps:
[0056] (1) Preparation of microsphere filler: Weigh the following raw materials in parts by weight, SiO 2 for 72 copies, B 2 o 3 The content is 23 parts, Na 2 O is 6 parts, K 2 O is 2 parts, BaO is 1 part; mix all components evenly and add to the melting furnace, the temperature in the melting furnace is controlled at 1500°C, until it is completely melted, quenched, crushed and classified to obtain fillers with a particle size of 1-10 μm Particles, transport the filler particles to a spheroidizing furnace, spheroidize for 2 hours at a temperature of 1350°C, and cool rapidly to obtain microsphere fillers;
[0057] (2) Preparation of electrophoretic fluid: the microsphere filler prepared by step (1) is dissolved in a mixed acid solution of sulfuric acid and nitric acid with a mass ratio of 3:1, activated for 3h, filtered, and washed with sodi...
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Abstract
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