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Plasma alkaline chemical polishing solution and application thereof

A chemical polishing and plasma technology, applied in polishing compositions, chemical instruments and methods, etc., can solve problems such as toxic nitrogen oxide gas, water pollution, air pollution, etc., and achieve improved surface reflectivity, high anti-pollution ability, Ease of Industrialization

Pending Publication Date: 2022-05-06
CHINA JILIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the composition of acidic polishing liquid, due to the presence of a large amount of nitric acid, toxic nitrogen oxide gas will be produced during the polishing process, causing air pollution
At the same time, a large amount of phosphoric acid is also used in the acidic polishing liquid, and if the phosphate ion is discharged into the external waters, it will cause quite serious water pollution.

Method used

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  • Plasma alkaline chemical polishing solution and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Example 1: Soak the aluminum alloy parts in a mixture of acetone and ethanol (the volume percentage of acetone and ethanol is 1:1) to degrease, then degrease in a weak alkaline solution, wash with water, and neutralize the acidic solution. Wash with water and set aside. Dip the above-treated aluminum alloy parts into a plasma alkaline chemical polishing solution for polishing. Polishing solution composition: Na 6 o 18 P 6 20g / L, NH 4 VO 3 5g / L, KF6g / L; NaOH 3g / L; KNaC 4 h 4 o 6 4H 2 O3g / L; EDTA 4g / L; Hexamethylene tetraammonium 1g / L; Surfactant W1g / L. Plasma polishing process: gradually adjust the voltage to 500V (within 1 minute), the frequency to 800HZ, the pulse ratio to 0.1, the duty cycle to 30%, and the time to 5 minutes.

[0022] The aluminum alloy obtained in this embodiment has high anti-pollution ability after polishing, the surface reflectivity reaches 91%, and the roughness is 0.1 μm.

Embodiment 2

[0023] Example 2: soak the aluminum alloy parts in a mixture of acetone and ethanol (the volume percentage of acetone and ethanol is 1:1) to remove oil, then remove oil in a weak alkaline solution, wash with water, and neutralize the acidic solution. Wash with water and set aside. Dip the above-treated aluminum alloy parts into a plasma alkaline chemical polishing solution for polishing. Polishing solution composition: Na 6 o 18 P 6 15g / L, NH 4 VO 3 15g / L, KF 2g / L; NaOH 2g / L; KNaC 4 h 4 O6·4H 2 O 5g / L; EDTA 6g / L; Hexamethylene tetraammonium 4g / L; Surfactant W1g / L. Plasma polishing process: gradually adjust the voltage to 600V (within 2 minutes), the frequency to 800HZ, the pulse ratio to 0.1, the duty cycle to 30%, and the time to 3 minutes.

[0024] The aluminum alloy obtained in this embodiment has high anti-pollution ability after polishing, the surface reflectivity reaches 92%, and the roughness is 0.05 μm.

Embodiment 3

[0025] Example 3: Soak aluminum alloy parts in a mixture of acetone and ethanol (the volume percentage of acetone and ethanol is 1:1) to remove oil, then remove oil in a weak alkaline solution, wash with water, and neutralize the acidic solution. Wash with water and set aside. Dip the above-treated aluminum alloy parts into a plasma alkaline chemical polishing solution for polishing. Polishing solution composition: Na 6 o 18 P 6 25g / L, NH 4 VO 3 10g / L, KF 6g / L; NaOH 6g / L; KNaC 4 h 4 o 6 4H 2 O 6g / L; EDTA 4g / L; Hexamethylenetetraammonium 3g / L; Surfactant W2g / L. Plasma polishing process: gradually adjust the voltage to 600V (within 2 minutes), the frequency to 900HZ, the pulse ratio to 0.1, the duty cycle to 35%, and the time to 2 minutes.

[0026] The aluminum alloy obtained in this embodiment has high anti-pollution ability after polishing, the surface reflectivity reaches 90%, and the roughness is 0.1 μm.

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Abstract

The invention provides a plasma alkaline chemical polishing solution and application thereof, and belongs to the technical field of chemical polishing of aluminum alloy parts. The invention provides a plasma alkaline chemical polishing solution, which is characterized by comprising the following components: 16 to 30 g / L of Na6O18P6, 6 to 15 g / L of NH4VO3, 2 to 8 g / L of KF, 2 to 10 g / L of NaOH, 3 to 8 g / L of KNaC4H4O6. 4H2O, 3 to 6 g / L of EDTA (Ethylene Diamine Tetraacetic Acid), 1 to 5 g / L of hexamethylenetetramine and 1 to 3 g / L of surfactant W. The result of the embodiment shows that the polishing solution provided by the invention can improve the anti-pollution capacity of the aluminum alloy, the surface reflectivity can reach 93%, and the roughness can be reduced to 0.05 mu m.

Description

[0001] This application is a divisional application with an application date of July 08, 2015, an application number of CN201510407671.4, and an invention title of "An Alkaline Polishing Process for Surfaces of Aluminum Alloys". technical field [0002] The invention relates to the technical field of chemical polishing of aluminum alloy parts, in particular to a plasma alkaline chemical polishing solution and application thereof. Background technique [0003] Aluminum and aluminum alloy products are widely used in the aviation industry and civil industries such as lamps, optical instruments, and jewelry. In order to improve the smoothness and finish of the surface of aluminum or aluminum products, it is often necessary to polish it. At present, the surface polishing of aluminum and aluminum alloys can be divided into mechanical polishing, chemical polishing and electrolytic polishing. Mechanical polishing is relatively labor-intensive, and the large-area polished surface is...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F3/02C09G1/18
Inventor 卫国英余云丹
Owner CHINA JILIANG UNIV