Composite film material and preparation method and application thereof
A composite film and layer composite technology, which is applied in photocatalysis, self-cleaning, and photothermal fields, can solve problems such as heat leakage, glass temperature rise, and energy waste.
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Embodiment 1
[0056] Example 1: WO 3 / Mo / NiCr / TiO 2 Preparation of composite multifunctional thin films (composite thin films with Mo layer sputtering time of 70 s, total thickness of 314 nm)
[0057] Proceed as follows:
[0058] (1) Clean the surface and back of the glass substrate to remove dust particles, organic and inorganic impurities, as follows:
[0059] (a) The glass substrate is placed in deionized water, and ultrasonically cleaned for 5 minutes to clean the surface dust;
[0060] (b) placing the glass substrate in an acetone solution, and ultrasonically cleaning for 5 minutes to remove organic impurities on the surface of the glass substrate;
[0061] (c) placing the glass substrate in an ethanol solution, and ultrasonically cleaning for 5 minutes to remove inorganic impurities on the surface of the glass substrate;
[0062] (d) Take out the glass substrate, blow dry the surface solution, and set aside.
[0063] (2) Preparation of WO by magnetron sputtering 3 film, as follo...
Embodiment 2
[0073] Example 2: WO 3 Preparation of / Mo / NiCr / ZnO composite multifunctional thin film (composite thin film with Mo layer sputtering time of 70 s, total thickness of 301 nm)
[0074] Proceed as follows:
[0075] (1) Clean the surface and back of the glass substrate to remove dust particles, organic and inorganic impurities, as follows:
[0076] (a) The glass substrate is placed in deionized water, and ultrasonically cleaned for 5 minutes to clean the surface dust;
[0077] (b) placing the glass substrate in an acetone solution, and ultrasonically cleaning for 5 minutes to remove organic impurities on the surface of the glass substrate;
[0078] (c) placing the glass substrate in an ethanol solution, and ultrasonically cleaning for 5 minutes to remove inorganic impurities on the surface of the glass substrate;
[0079] (d) Take out the glass substrate, blow dry the surface solution, and set aside.
[0080] (2) Preparation of WO by magnetron sputtering 3 film, as follows: ...
Embodiment 3
[0090] Example 3: WO 3 / Mo / NiCr / ZrO 2 Preparation of composite multifunctional thin films (composite thin films with Mo layer sputtering time of 70 s, total thickness of 321 nm)
[0091] Proceed as follows:
[0092] (1) Clean the surface and back of the glass substrate to remove dust particles, organic and inorganic impurities, as follows:
[0093] (a) The glass substrate is placed in deionized water, and ultrasonically cleaned for 5 minutes to clean the surface dust;
[0094] (b) placing the glass substrate in an acetone solution, and ultrasonically cleaning for 5 minutes to remove organic impurities on the surface of the glass substrate;
[0095] (c) placing the glass substrate in an ethanol solution, and ultrasonically cleaning for 5 minutes to remove inorganic impurities on the surface of the glass substrate;
[0096] (d) Take out the glass substrate, blow dry the surface solution, and set aside.
[0097] (2) Preparation of WO by magnetron sputtering 3 film, as follo...
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