Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing centimeter-level multiphase molybdenum disulfide film

A molybdenum disulfide, centimeter-level technology is applied in the field of preparing centimeter-level multiphase molybdenum disulfide thin films, which can solve problems such as complex process flow

Pending Publication Date: 2022-07-12
UNIV OF ELECTRONIC SCI & TECH OF CHINA
View PDF13 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Current multiphase MoS with coexistence of 2H and 1T phases 2 The preparation is more concentrated on the powder, large-area single-layer multi-phase MoS 2 There are still challenges in the preparation of heterogeneous MoS 2 The preparation of more is to prepare the 2H phase first and then perform phase transition (such as using lithium ion intercalation), the process is complicated, so large-area single-layer multi-phase MoS 2 The study of controllable devices is of great significance both in basic research and in practical applications

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing centimeter-level multiphase molybdenum disulfide film
  • Method for preparing centimeter-level multiphase molybdenum disulfide film
  • Method for preparing centimeter-level multiphase molybdenum disulfide film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] The heavily doped p-type silica / silicon substrate was ultrasonically treated with acetone, anhydrous ethanol and deionized water in sequence, and then the surface of the silica / silicon substrate was hydrophilic treated with Plasma.

[0039] Three 100mg S element, 20mg MoCl 5respectively placed on the quartz boat, MoCl 5 The ratio of S element and S element is 150:1, and three parts of S element and one part of MoCl are weighed. 5 The powder is placed in a quartz boat and sent to the two temperature zones of the tube furnace. One part of the S element is placed in the first temperature zone, and the remaining two parts of the S element and MoCl are placed 5 The powder is placed in the second temperature zone, MoCl 5 The powder is located between the two parts of S and will be heavily doped with p-type SiO 2 / Si substrate is placed in the second temperature zone MoCl 5 5cm behind the powder, such as figure 1 shown.

[0040] The device was evacuated to 0.1 Pa, 100 sc...

example 1

[0042] The optical image of the centimeter-scale heterogeneous molybdenum disulfide thin film grown in Example 1 is as follows figure 2 shown; image 3 For the heterogeneous molybdenum disulfide 100 ~ 500cm -1 Raman spectrum in the range of 350 to 430 cm -1 The typical A of 2H-phase molybdenum disulfide can be observed in the interval 1g and E 2g 1 Raman vibration characteristic peaks ( Figure 4 ), A 1g and E 2g 1 The difference is 20.3cm -1 , showing that the molybdenum disulfide film is a single-layer structure; -1 The typical J of 1T phase molybdenum disulfide can be observed in the interval 1 and J 2 Raman vibration characteristic peaks ( Figure 5 ), proving that this molybdenum disulfide is a monolayer multiphase structure (2H and 1T phases); Image 6 For the comparison of photoluminescence spectra of heterogeneous molybdenum disulfide and pure 2H-phase molybdenum disulfide, the figure shows that the heterogeneous molybdenum disulfide exhibits unique photo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for preparing a centimeter-level multiphase molybdenum disulfide film, and belongs to the technical field of semiconductor material preparation. According to the preparation method, three parts of sulfur powder and one part of molybdenum pentachloride powder are used as a sulfur source and a carbon source, and the set temperature of the second and third parts of elemental sulfur is the same as that of the molybdenum source, so that the evaporation rate of MoCl5 is effectively reduced, the molybdenum source is enabled to slowly evaporate, react and grow in the sulfur atmosphere, the growth of MoS2 small particles can be inhibited, and the uniformity and consistency of the MoS2 film are improved. The unique arrangement mode of the sulfur source and the molybdenum source enables MoS2 to be in a completely over-sulfurized state in the nucleation and continuous film forming process (because the evaporation temperature of MoCl5 is higher than that of S elementary substance), and the whole-course over-sulfurized state enables a 2H phase and a 1T phase to be realized in the same growth process at the same time. According to the preparation method, argon is used as carrier gas, a low-pressure chemical vapor deposition method is adopted, and the multi-phase molybdenum disulfide film is prepared on the heavily-doped p-type SiO2 / Si substrate; the multiphase molybdenum disulfide film prepared by the method has a 2H phase and a 1T phase at the same time.

Description

1. Technical field [0001] The invention belongs to the technical field of semiconductor material preparation, and in particular relates to a method for preparing centimeter-level heterogeneous molybdenum disulfide (MoS) by a low-pressure chemical vapor deposition method. 2 ) thin film method. 2. Background technology [0002] Since the twentieth century, a large number of scientific researchers have devoted themselves to the study of two-dimensional layered materials. The successful preparation of monolayer graphene, a typical representative of two-dimensional layered materials, provides new possibilities for the study of other two-dimensional layered materials. Two-dimensional transition metal dichalcogenides (TMDCs) materials themselves have strong intramolecular bonds and weak interlayer bonds. The weak interlayer bonds and extremely strong intramolecular bonds lead to a layered structure, and at the same time, exhibit an isotropic opposite sex. Due to the existence of...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C16/30C23C16/44C23C16/448
CPCC23C16/305C23C16/44C23C16/4481Y02P70/50
Inventor 周宇李猛李萍剑
Owner UNIV OF ELECTRONIC SCI & TECH OF CHINA
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More