Liquid for reducing copper oxides and process thereof
A technology of copper oxide and treatment method, which is applied in the secondary treatment of printed circuits, the improvement of metal adhesion of insulating substrates, electrical components, etc., and can solve the problem of treatment time, treatment temperature limitation, difficulty in reduction treatment cost, and easy to decompose treatment liquid Life and other issues, to achieve the effect of preventing treatment costs, increasing treatment costs, and preventing life shortening
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Embodiment 1
[0038] First, a 1 mm thick copper substrate (25.5 cm × 25.5 cm) with a thickness of 35 μm electrolytic copper foil was subjected to pretreatment (immersion in Empret PC-499 manufactured by Meltex Co., Ltd. at 70° C. for 5 minutes) →Water washing→Immerse in Meltex Co., Ltd. Melpure-to AD-331 at 25°C for 1 minute→Water washing→Immerse in 10% sulfuric acid aqueous solution at room temperature for 1 minute→Water washing→Meltex Co., Ltd. トMB-438A 35mL / L aqueous solution at room temperature for 1 minute). Then, immerse in an aqueous solution containing 80 mL / L of Empret MB-438A manufactured by Meltex Co., Ltd. and 130 mL / L of Empret MB-438B manufactured by Meltex Co., Ltd. (5 minutes at 80° C.), and then, After washing, a copper oxide film is formed on the surface. The surface of the copper oxide thin film has fine irregularities.
[0039] Next, dimethylamine borane was added to water so as to have the concentrations shown in the following Tables 1 and 2 to prepare treatment soluti...
Embodiment 2
[0049] First, in the same manner as in Example 1, a copper oxide thin film was formed on the surface of the copper substrate.
[0050] Next, dimethylamine borane was added to a basic bath (pH=13) having the following components so as to have the concentrations shown in Tables 3 and 4 below to prepare a treatment solution (sample 2-1 to 2-15 ), and after 5 minutes of preparation, the copper substrate on which the copper oxide was formed was dipped (at 50° C. for 5 minutes) to perform a reduction treatment of the copper oxide. Furthermore, the volume of the treatment liquid was adjusted so that the treated area of the copper substrate per unit volume of liquid was as shown in Tables 3 and 4 below.
[0051] (basic bath composition)
[0052] ·37% formaldehyde solution …10mL / L
[0053] ·Sodium hydroxide …10g / L
[0054] · Water … balance
[0055] After performing the reduction treatment and drying, the copper substrate was immersed in a 50% hydrochloric acid aqueous solution f...
Embodiment 3
[0060] First, in the same manner as in Example 1, a copper oxide thin film was formed on the surface of the copper substrate.
[0061] Next, the set treatment liquids (Samples 3-1 to 3-10) were prepared under the conditions of the concentration of dimethylamine borane, the concentration of 37% aqueous formaldehyde solution, and the pH of the treatment liquid as shown in Table 5 below. The treatment solution is prepared by adding dimethylamine borane to a basic bath containing an aqueous formaldehyde solution, and immersing the above-mentioned copper substrate for forming copper oxides (5 minutes at 50° C.) after preparation for 5 minutes to perform reduction treatment of copper oxides . Adjust the pH by changing the amount of sodium hydroxide added. Also, the treatment liquid volume was adjusted according to the copper substrate treatment area per unit liquid volume shown in Table 5 below.
[0062] After performing the reduction treatment and drying, the copper substrate was...
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