Titanium nitride based low radiation self-cleaned coated glass, and preparation
A coated glass, self-cleaning technology, used in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve problems such as increasing the cost of glass windows, avoid danger and high cost, improve light Catalytic efficiency and the effect of improving hydrophilicity
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Embodiment 1
[0017] Adopt JGC-40 magnetron sputtering machine when the glass substrate temperature is 350 ℃, according to the following sequence sputter coating: air pressure 0.4Pa titanium dioxide layer (1) 60nm; sputtering air pressure 0.8Pa, nitrogen / argon (flow ratio )=20%, TiN plated 1.2 40nm; sputtering gas pressure 0.5Pa plated titanium metal 5nm; sputtering gas pressure 0.9Pa coated titanium dioxide layer (2) 120nm. The film structure is: glass, titanium dioxide 60nm, TiN 1.2 40nm, metal titanium 5nm, titanium dioxide 120nm. The obtained properties are as follows: visible light transmittance 57%, radiation rate 0.35, photocatalytic degradation rate 100% in 2 hours (photocatalytic degradation is simulated by methylene blue aqueous solution), water wetting angle remains at 4 after 20 minutes of light °, after stopping the light for 2 hours, the wetting angle was 6°; the appearance of the coated product was light green reflected light; the relative content of nitrogen atoms on the t...
Embodiment 2
[0019] Adopt JGC-40 type magnetron sputtering machine when the substrate temperature is 280 ℃, sputter coating film in the following order: sputtering pressure 0.6Pa, titanium dioxide layer (1) 50nm; sputtering pressure 0.7Pa, nitrogen / argon ( Flow ratio) = 30%, TiN plated 0.9 30nm; sputtering gas pressure 0.6Pa, coating titanium metal 5nm; sputtering gas pressure 0.9Pa, coating titanium dioxide layer (2) 120nm. The film structure is: glass, titanium dioxide 50nm, TiN 0.9 30nm, metal titanium 5nm, titanium dioxide 120nm. The obtained properties are as follows: visible light transmittance 64%, radiation rate 0.32, photocatalytic degradation rate 100% in 2 hours (photocatalytic degradation is simulated by methylene blue aqueous solution), water wetting angle remains at 4 after 20 minutes of light °, after stopping the light for 2 hours, the wetting angle was 6°; the appearance of the coated product was light blue reflected light; the relative content of nitrogen atoms on the t...
Embodiment 3
[0021] Use JGC-40 type magnetron sputtering machine to sputter coating on the glass substrate in the following order: sputtering pressure 0.6Pa, zirconia layer 30nm; sputtering pressure 0.7Pa, nitrogen / argon (flow ratio) = 30 %, TiN 30nm; sputtering gas pressure 0.6Pa coating titanium 5nm; sputtering gas pressure 0.9Pa coating titanium dioxide layer 120nm. The film layer structure is: glass, zirconium dioxide 30nm, TiN 30nm, metal titanium 5nm, titanium dioxide 120nm. The obtained properties are as follows: visible light transmittance 72%, radiation rate 0.30, photocatalytic degradation rate 100% in 2 hours (photocatalytic degradation is simulated by methylene blue aqueous solution), water wetting angle remains at 4 after 20 minutes of light °, after 2 hours of stopping the light, the wetting angle is 6°; the appearance of the coated product is light blue reflected light; the relative content of nitrogen atoms on the titanium dioxide layer is 1.0% as determined by X-ray photoe...
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