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Titanium nitride based low radiation self-cleaned coated glass, and preparation

A coated glass, self-cleaning technology, used in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve problems such as increasing the cost of glass windows, avoid danger and high cost, improve light Catalytic efficiency and the effect of improving hydrophilicity

Inactive Publication Date: 2007-01-24
WUHAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This approach increases the cost of glass windows and is not suitable for promotion and use in our country.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] Adopt JGC-40 magnetron sputtering machine when the glass substrate temperature is 350 ℃, according to the following sequence sputter coating: air pressure 0.4Pa titanium dioxide layer (1) 60nm; sputtering air pressure 0.8Pa, nitrogen / argon (flow ratio )=20%, TiN plated 1.2 40nm; sputtering gas pressure 0.5Pa plated titanium metal 5nm; sputtering gas pressure 0.9Pa coated titanium dioxide layer (2) 120nm. The film structure is: glass, titanium dioxide 60nm, TiN 1.2 40nm, metal titanium 5nm, titanium dioxide 120nm. The obtained properties are as follows: visible light transmittance 57%, radiation rate 0.35, photocatalytic degradation rate 100% in 2 hours (photocatalytic degradation is simulated by methylene blue aqueous solution), water wetting angle remains at 4 after 20 minutes of light °, after stopping the light for 2 hours, the wetting angle was 6°; the appearance of the coated product was light green reflected light; the relative content of nitrogen atoms on the t...

Embodiment 2

[0019] Adopt JGC-40 type magnetron sputtering machine when the substrate temperature is 280 ℃, sputter coating film in the following order: sputtering pressure 0.6Pa, titanium dioxide layer (1) 50nm; sputtering pressure 0.7Pa, nitrogen / argon ( Flow ratio) = 30%, TiN plated 0.9 30nm; sputtering gas pressure 0.6Pa, coating titanium metal 5nm; sputtering gas pressure 0.9Pa, coating titanium dioxide layer (2) 120nm. The film structure is: glass, titanium dioxide 50nm, TiN 0.9 30nm, metal titanium 5nm, titanium dioxide 120nm. The obtained properties are as follows: visible light transmittance 64%, radiation rate 0.32, photocatalytic degradation rate 100% in 2 hours (photocatalytic degradation is simulated by methylene blue aqueous solution), water wetting angle remains at 4 after 20 minutes of light °, after stopping the light for 2 hours, the wetting angle was 6°; the appearance of the coated product was light blue reflected light; the relative content of nitrogen atoms on the t...

Embodiment 3

[0021] Use JGC-40 type magnetron sputtering machine to sputter coating on the glass substrate in the following order: sputtering pressure 0.6Pa, zirconia layer 30nm; sputtering pressure 0.7Pa, nitrogen / argon (flow ratio) = 30 %, TiN 30nm; sputtering gas pressure 0.6Pa coating titanium 5nm; sputtering gas pressure 0.9Pa coating titanium dioxide layer 120nm. The film layer structure is: glass, zirconium dioxide 30nm, TiN 30nm, metal titanium 5nm, titanium dioxide 120nm. The obtained properties are as follows: visible light transmittance 72%, radiation rate 0.30, photocatalytic degradation rate 100% in 2 hours (photocatalytic degradation is simulated by methylene blue aqueous solution), water wetting angle remains at 4 after 20 minutes of light °, after 2 hours of stopping the light, the wetting angle is 6°; the appearance of the coated product is light blue reflected light; the relative content of nitrogen atoms on the titanium dioxide layer is 1.0% as determined by X-ray photoe...

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PUM

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Abstract

Magnetic controlled sputter method is used by the invention. the film layer structure from base glass to outside layer is glass, transitional layer, dielectric layer, TiNx layer, metal layer, titanium dioxide layer. TiNx film layer has ability of anti-infrared ray can be used to reduce radiant ratio of glass. Titanium dioxide film layer has performance of self-cleaning is combined with dielectric layer to reduce reflecting ratio for visible light of the coated glass. the coated glass has high efficiency of photocatalysis degrading organic substances by proper heat treatment to resolve micro quantity of TiNx and make micro quantity of N spreading into titanium deoxide film. The colour of said coated glass can be changed from blue to yellow by changing X value in TiNx and thickness of dielectric layer and titanium deoxide layer.

Description

technical field [0001] The invention relates to a coated glass with a low-radiation self-cleaning composite functional film layer coated on an ordinary glass substrate by a magnetron sputtering method, specifically a transition layer and a dielectric layer sequentially coated on a glass substrate by a magnetron sputtering method layer, TiN x , metal layer and titanium dioxide layer of low-radiation self-cleaning composite functional coated glass. Background technique [0002] The basic structure of traditional low-emissivity glass is: glass, dielectric layer 1, protective layer 1, silver layer, protective layer 2, and dielectric layer 2. The main functional layer that reflects infrared rays is the silver layer, but the silver layer will cause light transmission. Low, high reflection, susceptible to mechanical wear, expensive, its biggest disadvantage is poor physical and chemical properties, easy to be corroded, forming black spots on the glass surface, causing the film to ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/36C23C14/35C23C14/06
Inventor 赵青南赵修建李春领
Owner WUHAN UNIV OF TECH