Holographic grating making process

A manufacturing method and technology of holographic gratings, applied in the field of integrated optics, can solve problems such as difficult control, high difficulty, and inapplicability, and achieve the effects of easy control, cost control, and convenient selection

Inactive Publication Date: 2002-02-13
SHANGHAI JIAO TONG UNIV
View PDF2 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This process is actually a sol-gel reaction on the surface of the substrate material first, and then irradiated with a coherent light source. It is very difficult to operate in practice, and it is not easy to control.
This method is also not suitable for the preparation of local gratings required in integrated optical circuits

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Holographic grating making process
  • Holographic grating making process
  • Holographic grating making process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] The grating material uses a polymer called polyimide. Use 3,3',4,4'-tetraacid dianhydride benzophenone and 3,3'-dimethyl-4,4'-diaminodiphenylmethane as diamine to prepare polyimide , dissolved in N-methyl-2-pyrrolidone to form a solution, and the solid content is controlled at about 10%. The solution was spin-coated on a cleaned glass plate, and the temperature was raised step by step to volatilize the solvent, and a polyimide film with a thickness of about 1 micron was obtained on the substrate.

[0020] Place the substrate on a laser scanning mobile platform, the moving direction of the platform is parallel to the laser polarization direction, adjust the laser pulse width to 5ns, the pulse frequency to 10Hz, the wavelength to 355nm, the incident angle to 20°, and the incident beam power density to 20mJ / cm 2 , the polarization direction is in-plane polarization, the moving speed is 0.5mm / s, and the number of repeated scans is 5 times. From the obtained atomic force m...

Embodiment 2

[0022] Prepare the polyimide film with the same method as in Example 1, the platform movement direction is perpendicular to the laser polarization direction, adjust the laser pulse width to be 5ns, the pulse frequency is 10Hz, the wavelength is 266nm, the incident angle is 20 °, and the incident beam power The density is 30mJ / cm 2 , the polarization direction is in-plane polarization, the moving speed is 0.005mm / s in the X direction, and 5mm / s in the Y direction. A very regular surface groove structure is also obtained.

Embodiment 3

[0024] The polymer is selected from polyethylene terephthalate (PET) film, and the thickness of the film is about 0.5mm. Fix the film on the mobile platform, the moving direction of the platform is parallel to the laser polarization direction, adjust the pulse width to 5ns, the pulse frequency to 10Hz, the wavelength to 248nm, the incident angle to 20°, and the incident beam power density to 5mJ / cm 2 , the polarization direction is in-plane polarization, the moving speed is 0.5mm / s, and the number of repeated scans is 7 times.

[0025] FIG. 3 is an atomic force microscope image of the trench structure obtained in Example 1. FIG.

[0026] As can be seen from the figure, the surface groove pitch obtained on the polyimide surface in Example 1 is about 330nm, and the measured depth is about 90nm;

[0027] Figure 4 It is a scanning electron microscope image of the trench structure obtained in Example 2.

[0028] As can be seen from the figure, the surface groove pitch obtained o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

Through laser scanning process and by means of the surface diffusion wave interference of single laser beam on the surface of some material, straight line channel strength is formed on the surface ofthe material and holographic grating in different interval and different depth may be made. After the selected grating material is cleaned and cut, it is placed on computer controlled moving platformand through stepped laser scanning and regulating the technological parameters, including pulse width, frequency, incident angle, power density, etc., regular channel structure is formed on the surface of the material. The present invention has simple process, easy control, wide material selecting range and controlled cost.

Description

Technical field: [0001] The invention relates to a manufacturing method of a holographic grating, which adopts a laser scanning method and utilizes the principle of diffusion wave interference of a single beam on a material surface to manufacture a holographic grating with variable grating frequency and variable depth. The invention belongs to the technical field of integrated optics and optical device manufacturing. Background technique [0002] As an important device, gratings are more and more widely used in couplers, waveguides, converters, etc. In today's integrated optical research and various optical measurement instruments, holographic gratings are even more common components. [0003] The traditional method of making gratings is the machine engraving method, that is, using the engraving machine to engrave grooves one by one on the surface of the grating material (semiconductor, crystal, plastic, glass, etc.). The requirements almost reach the limit precision of mec...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/32G03H1/04
Inventor 路庆华朱承翔李梅陆学民王宗光
Owner SHANGHAI JIAO TONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap